Inventor
KAMINISHI MASAHIKO
JP10 patents
Patents
10 patentsUS9929008B2Mar 27, 2018
Substrate processing method and substrate processing apparatus
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US8962495B2Feb 24, 2015
Film deposition method
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US8354135B2Jan 15, 2013
Thermal processing apparatus, method for regulating temperature of thermal processing apparatus, and program
TOKYO ELECTRON LTD4 citations62
US9252043B2Feb 2, 2016
Film deposition method
TOKYO ELECTRON LTD2 citations61
US8987147B2Mar 24, 2015
Method of depositing a film using a turntable apparatus
TOKYO ELECTRON LTD3 citations61
US10053776B2Aug 21, 2018
Method of detoxifying exhaust pipe and film forming apparatus
TOKYO ELECTRON LTD0 citations50
US8778812B2Jul 15, 2014
Apparatus and method of forming thin film including adsorption step and reaction step
TOKYO ELECTRON LTD1 citations47
US8980371B2Mar 17, 2015
Film deposition method
TOKYO ELECTRON LTD0 citations41
US7637268B2Dec 29, 2009
Film formation method and apparatus for semiconductor process
TOKYO ELECTRON LTD0 citations40
US10472719B2Nov 12, 2019
Nozzle and substrate processing apparatus using same
TOKYO ELECTRON LTD0 citations39