Inventor
USUI TATEHITO
JP65 patents
⚠️ This page may combine multiple inventors who share the name “USUI TATEHITO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
30 patentsUS5242539ASep 7, 1993
Plasma treatment method and apparatus
HITACHI LTD602 citations99
US6755932B2Jun 29, 2004
Plasma processing system and apparatus and a sample processing method
HITACHI LTD290 citations98
US6503364B1Jan 7, 2003
Plasma processing apparatus
HITACHI LTD92 citations97
US6815228B2Nov 9, 2004
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
HITACHI LTD60 citations96
US6373681B2Apr 16, 2002
Electrostatic chuck, and method of and apparatus for processing sample using the chuck
HITACHI LTD67 citations96
US6243251B1Jun 5, 2001
Electrostatic chuck, and method of and apparatus for processing sample using the chuck
HITACHI LTD50 citations96
US5946184AAug 31, 1999
Electrostatic chuck, and method of and apparatus for processing sample
HITACHI LTD87 citations96
US5895586AApr 20, 1999
Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum
HITACHI LTD74 citations96
US6961131B2Nov 1, 2005
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
HITACHI LTD24 citations93
US6903826B2Jun 7, 2005
Method and apparatus for determining endpoint of semiconductor element fabricating process
HITACHI LTD33 citations93
US6537832B2Mar 25, 2003
Measuring apparatus and film formation method
HITACHI LTD18 citations93
US6759253B2Jul 6, 2004
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
HITACHI LTD27 citations92
US6427621B1Aug 6, 2002
Plasma processing device and plasma processing method
HITACHI LTD42 citations92
US6750977B2Jun 15, 2004
Apparatus for monitoring thickness of deposited layer in reactor and dry processing method
HITACHI LTD16 citations84
US6596551B1Jul 22, 2003
Etching end point judging method, etching end point judging device, and insulating film etching method using these methods
HITACHI LTD17 citations84
US5235399AAug 10, 1993
Temperature measuring apparatus utilizing radiation
HITACHI LTD20 citations79
US7411684B2Aug 12, 2008
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
HITACHI LTD5 citations74
US7126697B2Oct 24, 2006
Method and apparatus for determining endpoint of semiconductor element fabricating process
HITACHI LTD5 citations74
US7009715B2Mar 7, 2006
Method and apparatus for determining endpoint of semiconductor element fabricating process and method and apparatus for processing member to be processed
HITACHI LTD7 citations74
US6967109B2Nov 22, 2005
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
HITACHI LTD6 citations74
US6923885B2Aug 2, 2005
Plasma processing system and apparatus and a sample processing method
HITACHI LTD11 citations73
US11152237B2Oct 19, 2021
Substitute sample, method for determining control parameter of processing, and measurement system
HITACHI LTD2 citations72
US6716300B2Apr 6, 2004
Emission spectroscopic processing apparatus
HITACHI LTD8 citations72
US7230720B2Jun 12, 2007
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
HITACHI LTD3 citations63
US6830649B2Dec 14, 2004
Apparatus and method for producing semiconductors
HITACHI LTD6 citations63
US6797529B2Sep 28, 2004
Processing apparatus with measuring unit and method
HITACHI LTD3 citations63
US11287782B2Mar 29, 2022
Computer, method for determining processing control parameter, substitute sample, measurement system, and measurement method
HITACHI LTD1 citations62
US7686917B2Mar 30, 2010
Plasma processing system and apparatus and a sample processing method
HITACHI LTD2 citations62
US7169254B2Jan 30, 2007
Plasma processing system and apparatus and a sample processing method
HITACHI LTD3 citations62
US6656752B1Dec 2, 2003
Ion current density measuring method and instrument, and semiconductor device manufacturing method
HITACHI LTD5 citations62
HITACHI HIGH TECH CORP
16 patentsUS10008370B2Jun 26, 2018
Plasma processing apparatus and operation method thereof
HITACHI HIGH TECH CORP23 citations94
US10453695B2Oct 22, 2019
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP7 citations84
US9934946B2Apr 3, 2018
Plasma processing apparatus and operating method of plasma processing apparatus
HITACHI HIGH TECH CORP9 citations84
US10672595B2Jun 2, 2020
Plasma processing apparatus and operation method thereof
HITACHI HIGH TECH CORP3 citations73
US7259866B2Aug 21, 2007
Semiconductor fabricating apparatus with function of determining etching processing state
HITACHI HIGH TECH CORP9 citations73
US10665516B2May 26, 2020
Etching method and plasma processing apparatus
HITACHI HIGH TECH CORP3 citations72
US6890771B2May 10, 2005
Plasma processing method using spectroscopic processing unit
HITACHI HIGH TECH CORP6 citations72
US11437289B2Sep 6, 2022
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP4 citations71
US10020233B2Jul 10, 2018
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP2 citations71
US9741629B2Aug 22, 2017
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP3 citations71
US6835665B2Dec 28, 2004
Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method
HITACHI HIGH TECH CORP5 citations63
US11915951B2Feb 27, 2024
Plasma processing method
HITACHI HIGH TECH CORP1 citations62
US11239097B2Feb 1, 2022
Etching apparatus and etching method and detecting apparatus of film thickness
HITACHI HIGH TECH CORP1 citations62
US10971369B2Apr 6, 2021
Plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP0 citations62
US12131964B2Oct 29, 2024
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations61
US11424110B2Aug 23, 2022
Plasma processing apparatus and operational method thereof
HITACHI HIGH TECH CORP0 citations61
USUI TATEHITO
3 patentsHITACH HIGH TECHNOLOGIES CORP
1 patentShowing the top 50 of 65 patents by PatentIndex Score.