Inventor

KAEPPELER JOHANNES

DE20 patents

⚠️ This page may combine multiple inventors who share the name “KAEPPELER JOHANNES”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KAEPPELER JOHANNES

AIXTRON AG

Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates

Method and device for the temperature control of surface temperatures of substrates in a CVD reactor

Gas-admission element for CVD processes, and device

CVD reactor

Method for depositing especially crystalline layers from the gas phase onto especially crystalline substrates

Loading and unloading apparatus for a coating device

Method and device for the temperature control of surface temperatures of substrates in a CVD reactor

Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned

CVD reactor with graphite-foam insulated, tubular susceptor

CVD reactor with substrate holder which is rotatably driven and mounted by a gas stream

Inlet system for an MOCVD reactor

CVD coating device

Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates

Device for the deposition of crystalline layers on crystalline substrates

CVD reactor comprising a photodiode array

DAUELSBERG MARTIN

CVD reactor comprising a gas inlet member

CVD reactor having a process-chamber ceiling which can be lowered

KAEPPELER JOHANNES

CVD coating device

CVD reactor with RF-heated process chamber

FRANKEN WALTER

Device for the temperature control of the surface temperatures of substrates in a CVD reactor