Inventor
STRAUCH GERHARD KARL
DE15 patents
⚠️ This page may combine multiple inventors who share the name “STRAUCH GERHARD KARL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AIXTRON AG
11 patentsUS7147718B2Dec 12, 2006
Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates
AIXTRON AG30 citations92
US7128785B2Oct 31, 2006
Method for depositing especially crystalline layers from the gas phase onto especially crystalline substrates
AIXTRON AG48 citations89
US6962624B2Nov 8, 2005
Method and device for depositing in particular organic layers using organic vapor phase deposition
AIXTRON AG38 citations89
US7709398B2May 4, 2010
Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned
AIXTRON AG19 citations82
US7524532B2Apr 28, 2009
Process for depositing thin layers on a substrate in a process chamber of adjustable height
AIXTRON AG18 citations82
US6972050B2Dec 6, 2005
Method for depositing in particular crystalline layers, and device for carrying out the method
AIXTRON AG17 citations81
US7625448B2Dec 1, 2009
Inlet system for an MOCVD reactor
AIXTRON AG18 citations80
US7067012B2Jun 27, 2006
CVD coating device
AIXTRON AG9 citations73
US7332038B2Feb 19, 2008
Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates
AIXTRON AG5 citations62
US7282096B2Oct 16, 2007
Arrangement comprising a support body and a substrate holder which is driven in rotation and gas-supported thereon
AIXTRON AG5 citations62
US6905548B2Jun 14, 2005
Device for the deposition of crystalline layers on crystalline substrates
AIXTRON AG5 citations62