Inventor
SCHUELER BRUNO W
US19 patents
⚠️ This page may combine multiple inventors who share the name “SCHUELER BRUNO W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NOVA MEASURING INSTR INC
12 patentsUS10859519B2Dec 8, 2020
Methods and systems for measuring periodic structures using multi-angle x-ray reflectance scatterometry (XRS)
NOVA MEASURING INSTR INC3 citations83
US10481112B2Nov 19, 2019
Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS)
NOVA MEASURING INSTR INC4 citations83
US10119925B2Nov 6, 2018
Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS)
NOVA MEASURING INSTR INC7 citations83
US10056242B2Aug 21, 2018
Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry
NOVA MEASURING INSTR INC5 citations82
US11996259B2May 28, 2024
Patterned x-ray emitting target
NOVA MEASURING INSTR INC2 citations72
US12165863B2Dec 10, 2024
Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry
NOVA MEASURING INSTR INC0 citations61
US11764050B2Sep 19, 2023
Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry
NOVA MEASURING INSTR INC0 citations61
US11430647B2Aug 30, 2022
Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry
NOVA MEASURING INSTR INC0 citations61
US10910208B2Feb 2, 2021
Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry
NOVA MEASURING INSTR INC0 citations61
US12360063B2Jul 15, 2025
System and method for measuring a sample by x-ray reflectance scatterometry
NOVA MEASURING INSTR INC0 citations59
US10636644B2Apr 28, 2020
Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry
NOVA MEASURING INSTR INC0 citations51
US10403489B2Sep 3, 2019
Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry
NOVA MEASURING INSTR INC0 citations51