P

Inventor

KUENLE MATTHIAS

AT21 patents
⚠️ This page may combine multiple inventors who share the name “KUENLE MATTHIAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

INFINEON TECHNOLOGIES AG

15 patents
US9647083B2May 9, 2017

Producing a semiconductor device by epitaxial growth

INFINEON TECHNOLOGIES AG6 citations82
US10529809B2Jan 7, 2020

Method of manufacturing a power semiconductor device

INFINEON TECHNOLOGIES AG2 citations72
US10186587B2Jan 22, 2019

Power semiconductor device

INFINEON TECHNOLOGIES AG4 citations72
US12211703B2Jan 28, 2025

Methods for forming a semiconductor device having a second semiconductor layer on a first semiconductor layer

INFINEON TECHNOLOGIES AG0 citations62
US11742215B2Aug 29, 2023

Methods for forming a semiconductor device

INFINEON TECHNOLOGIES AG1 citations62
US11515264B2Nov 29, 2022

Method for processing a semiconductor wafer, semiconductor composite structure and support structure for semiconductor wafer

INFINEON TECHNOLOGIES AG0 citations62
US10410911B2Sep 10, 2019

Buried insulator regions and methods of formation thereof

INFINEON TECHNOLOGIES AG1 citations62
US12532748B2Jan 20, 2026

Semiconductor substrate having an alignment structure

INFINEON TECHNOLOGIES AG0 citations61
US11004963B2May 11, 2021

Insulated gate bipolar transistor having first and second field stop zone portions and manufacturing method

INFINEON TECHNOLOGIES AG0 citations61
US10325803B2Jun 18, 2019

Semiconductor wafer and method for processing a semiconductor wafer

INFINEON TECHNOLOGIES AG0 citations51
US9984915B2May 29, 2018

Semiconductor wafer and method for processing a semiconductor wafer

INFINEON TECHNOLOGIES AG0 citations51
US11149351B2Oct 19, 2021

Apparatus and method for chemical vapor deposition process for semiconductor substrates

INFINEON TECHNOLOGIES AG0 citations50
US12018369B2Jun 25, 2024

Substrate processing chamber and process gas flow deflector for use in the processing chamber

INFINEON TECHNOLOGIES AG0 citations48
US10727311B2Jul 28, 2020

Method for manufacturing a power semiconductor device having a reduced oxygen concentration

INFINEON TECHNOLOGIES AG0 citations48
US10825716B2Nov 3, 2020

Method for manufacturing a semiconductor device

INFINEON TECHNOLOGIES AG0 citations42

INFINEON TECHNOLOGIES AUSTRIA AG

5 patents

INFINEON TECHNOLOGIES AUSTRIA

1 patent