P

Inventor

SHAO KAI

CN19 patents
⚠️ This page may combine multiple inventors who share the name “SHAO KAI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHARTERED SEMICONDUCTOR MFG

13 patents
US6133079AOct 17, 2000

Method for reducing substrate capacitive coupling of a thin film inductor by reverse P/N junctions

CHARTERED SEMICONDUCTOR MFG88 citations98
US6297132B1Oct 2, 2001

Process to control the lateral doping profile of an implanted channel region

CHARTERED SEMICONDUCTOR MFG128 citations97
US6124194ASep 26, 2000

Method of fabrication of anti-fuse integrated with dual damascene process

CHARTERED SEMICONDUCTOR MFG90 citations97
US6117747ASep 12, 2000

Integration of MOM capacitor into dual damascene process

CHARTERED SEMICONDUCTOR MFG73 citations95
US6410394B1Jun 25, 2002

Method for forming self-aligned channel implants using a gate poly reverse mask

CHARTERED SEMICONDUCTOR MFG21 citations92
US6300201B1Oct 9, 2001

Method to form a high K dielectric gate insulator layer, a metal gate structure, and self-aligned channel regions, post source/drain formation

CHARTERED SEMICONDUCTOR MFG70 citations92
US6291307B1Sep 18, 2001

Method and structure to make planar analog capacitor on the top of a STI structure

CHARTERED SEMICONDUCTOR MFG36 citations92
US6156602ADec 5, 2000

Self-aligned precise high sheet RHO register for mixed-signal application

CHARTERED SEMICONDUCTOR MFG43 citations92
US6284594B1Sep 4, 2001

Formation of an interpoly capacitor structure using a chemical mechanical polishing procedure

CHARTERED SEMICONDUCTOR MFG16 citations83
US6489191B2Dec 3, 2002

Method for forming self-aligned channel implants using a gate poly reverse mask

CHARTERED SEMICONDUCTOR MFG8 citations73
US6159759ADec 12, 2000

Method to form liquid crystal displays using a triple damascene technique

CHARTERED SEMICONDUCTOR MFG7 citations73
US6861317B1Mar 1, 2005

Method of making direct contact on gate by using dielectric stop layer

CHARTERED SEMICONDUCTOR MFG10 citations72
US7382027B2Jun 3, 2008

MOSFET device with low gate contact resistance

CHARTERED SEMICONDUCTOR MFG4 citations61

UNIV CHONGQING POSTS & TELECOM

3 patents

HUAWEI TECH CO LTD

1 patent

SHANGHAI UNITED IMAGING HEALTHCARE CO LTD

1 patent

X6 TECH LIMITED

1 patent