P

Inventor

NAKAGAWA HIDEO

JP79 patents
⚠️ This page may combine multiple inventors who share the name “NAKAGAWA HIDEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

20 patents
US6030667AFeb 29, 2000

Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD194 citations99
US6632746B2Oct 14, 2003

Etching method, semiconductor and fabricating method for the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD51 citations96
US5838111ANov 17, 1998

Plasma generator with antennas attached to top electrodes

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD53 citations96
US5057689AOct 15, 1991

Scanning electron microscope and a method of displaying cross sectional profiles using the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD63 citations94
US6518191B2Feb 11, 2003

Method for etching organic film, method for fabricating semiconductor device and pattern formation method

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD23 citations93
US6524948B2Feb 25, 2003

Semiconductor device and method for fabricating the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD45 citations92
US7233052B2Jun 19, 2007

Semiconductor device including fine dummy patterns

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations84
US7132473B2Nov 7, 2006

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD11 citations84
US7119354B2Oct 10, 2006

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations84
US7084505B2Aug 1, 2006

Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD14 citations84
US6930393B2Aug 16, 2005

Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD12 citations84
US6762120B2Jul 13, 2004

Semiconductor device and method for fabricating the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD18 citations84
US6531402B2Mar 11, 2003

Method for etching organic film, method for fabricating semiconductor device and pattern formation method

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations74
US6514873B1Feb 4, 2003

Method for fabricating semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD6 citations74
US7282452B2Oct 16, 2007

Etching method, semiconductor and fabricating method for the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD9 citations73
US6828247B2Dec 7, 2004

Method for etching organic film, method for fabricating semiconductor device and pattern formation method

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD7 citations73
US6451620B2Sep 17, 2002

Method for etching organic film, method for fabricating semiconductor device and pattern formation method

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD6 citations73
US6562710B2May 13, 2003

Semiconductor device and method for fabricating the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD9 citations71
US6514647B1Feb 4, 2003

Photomask, resist pattern formation method, method of determining alignment accuracy and method of fabricating semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations71
US7357961B2Apr 15, 2008

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD4 citations63

SHINETSU CHEMICAL CO

8 patents

TEIJIN LTD

7 patents

PANASONIC CORP

6 patents

KAKINO YOSHIAKI

5 patents

RICOH KK

1 patent

MATSUSHITA ELECTRONICS CORP

1 patent

OKK CORP

1 patent

NAKAJIMA MIKIO

1 patent

Showing the top 50 of 79 patents by PatentIndex Score.