Inventor
NAKAGAWA HIDEO
JP79 patents
⚠️ This page may combine multiple inventors who share the name “NAKAGAWA HIDEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
20 patentsUS6030667AFeb 29, 2000
Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD194 citations99
US6632746B2Oct 14, 2003
Etching method, semiconductor and fabricating method for the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD51 citations96
US5838111ANov 17, 1998
Plasma generator with antennas attached to top electrodes
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD53 citations96
US5057689AOct 15, 1991
Scanning electron microscope and a method of displaying cross sectional profiles using the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD63 citations94
US6518191B2Feb 11, 2003
Method for etching organic film, method for fabricating semiconductor device and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD23 citations93
US6524948B2Feb 25, 2003
Semiconductor device and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD45 citations92
US7233052B2Jun 19, 2007
Semiconductor device including fine dummy patterns
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations84
US7132473B2Nov 7, 2006
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD11 citations84
US7119354B2Oct 10, 2006
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations84
US7084505B2Aug 1, 2006
Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD14 citations84
US6930393B2Aug 16, 2005
Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD12 citations84
US6762120B2Jul 13, 2004
Semiconductor device and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD18 citations84
US6531402B2Mar 11, 2003
Method for etching organic film, method for fabricating semiconductor device and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations74
US6514873B1Feb 4, 2003
Method for fabricating semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD6 citations74
US7282452B2Oct 16, 2007
Etching method, semiconductor and fabricating method for the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD9 citations73
US6828247B2Dec 7, 2004
Method for etching organic film, method for fabricating semiconductor device and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD7 citations73
US6451620B2Sep 17, 2002
Method for etching organic film, method for fabricating semiconductor device and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD6 citations73
US6562710B2May 13, 2003
Semiconductor device and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD9 citations71
US6514647B1Feb 4, 2003
Photomask, resist pattern formation method, method of determining alignment accuracy and method of fabricating semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations71
US7357961B2Apr 15, 2008
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD4 citations63
SHINETSU CHEMICAL CO
8 patentsUS7754330B2Jul 13, 2010
Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device
SHINETSU CHEMICAL CO24 citations93
US7923522B2Apr 12, 2011
Process for preparing a dispersion liquid of zeolite fine particles
SHINETSU CHEMICAL CO17 citations84
US7405459B2Jul 29, 2008
Semiconductor device comprising porous film
SHINETSU CHEMICAL CO13 citations84
US7244657B2Jul 17, 2007
Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
SHINETSU CHEMICAL CO5 citations74
US9268212B2Feb 23, 2016
Photomask blank and method for manufacturing photomask
SHINETSU CHEMICAL CO3 citations72
US9158192B2Oct 13, 2015
Half-tone phase shift mask blank and method for manufacturing half-tone phase shift mask
SHINETSU CHEMICAL CO4 citations72
US7402621B2Jul 22, 2008
Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device
SHINETSU CHEMICAL CO7 citations71
US12342467B2Jun 24, 2025
Microstructure-transfer apparatus, stamp head unit, stamp component for transferring microstructure, and method for transferring microstructure-integrated component
SHINETSU CHEMICAL CO1 citations63
TEIJIN LTD
7 patentsUS5215795AJun 1, 1993
Shock-absorbing air bag
TEIJIN LTD68 citations96
US5296278AMar 22, 1994
Gastight woven fabric sheet for air bags and a process for producing same
TEIJIN LTD66 citations95
US5470106ANov 28, 1995
Air bag having a high burst strength
TEIJIN LTD32 citations93
US5607183AMar 4, 1997
Air bag provided with reinforcing belts
TEIJIN LTD53 citations92
US5540965AJul 30, 1996
Woven fabric for high performance air bags and process for producing same
TEIJIN LTD43 citations92
US5474836ADec 12, 1995
Polyester filament woven fabric for air bags
TEIJIN LTD39 citations92
US5441798AAug 15, 1995
Filter cloth for air bags
TEIJIN LTD33 citations92
PANASONIC CORP
6 patentsUS7731862B2Jun 8, 2010
Dry etching method, fine structure formation method, mold and mold fabrication method
PANASONIC CORP9 citations84
US7663239B2Feb 16, 2010
Semiconductor device and method for fabricating the same
PANASONIC CORP12 citations84
US7919005B2Apr 5, 2011
Dry etching method, fine structure formation method, mold and mold fabrication method
PANASONIC CORP4 citations63
US7906030B2Mar 15, 2011
Dry etching method, fine structure formation method, mold and mold fabrication method
PANASONIC CORP4 citations63
US7758761B2Jul 20, 2010
Dry etching method, fine structure formation method, mold and mold fabrication method
PANASONIC CORP4 citations63
US7659626B2Feb 9, 2010
Semiconductor device including a barrier metal film
PANASONIC CORP2 citations63
KAKINO YOSHIAKI
5 patentsUS6384560B1May 7, 2002
Abnormality detection apparatus for tool and numerical control apparatus provided with same
KAKINO YOSHIAKI39 citations91
US6650960B2Nov 18, 2003
Machining control system
KAKINO YOSHIAKI13 citations83
US6551033B2Apr 22, 2003
Tapping apparatus and method
KAKINO YOSHIAKI15 citations82
US6344724B1Feb 5, 2002
Numerical control apparatus for NC machine tool
KAKINO YOSHIAKI17 citations82
US6437534B1Aug 20, 2002
Control method for NC machine tool
KAKINO YOSHIAKI11 citations72
RICOH KK
1 patentMATSUSHITA ELECTRONICS CORP
1 patentOKK CORP
1 patentNAKAJIMA MIKIO
1 patentShowing the top 50 of 79 patents by PatentIndex Score.