Inventor
IIZUKA HACHISHIRO
JP27 patents
⚠️ This page may combine multiple inventors who share the name “IIZUKA HACHISHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IIZUKA HACHISHIRO
13 patentsUS8282769B2Oct 9, 2012
Shower head and plasma processing apparatus having same
IIZUKA HACHISHIRO549 citations98
US8152925B2Apr 10, 2012
Baffle plate and substrate processing apparatus
IIZUKA HACHISHIRO36 citations92
US8236106B2Aug 7, 2012
Shower head and substrate processing apparatus
IIZUKA HACHISHIRO21 citations85
US8852387B2Oct 7, 2014
Plasma processing apparatus and shower head
IIZUKA HACHISHIRO6 citations72
US8852386B2Oct 7, 2014
Plasma processing apparatus
IIZUKA HACHISHIRO5 citations71
US8747609B2Jun 10, 2014
Plasma processing apparatus and shower head
IIZUKA HACHISHIRO4 citations71
US8986495B2Mar 24, 2015
Plasma processing apparatus
IIZUKA HACHISHIRO2 citations62
US8758550B2Jun 24, 2014
Shower head and plasma processing apparatus having same
IIZUKA HACHISHIRO3 citations62
US8674607B2Mar 18, 2014
Plasma processing apparatus and processing gas supply structure thereof
IIZUKA HACHISHIRO3 citations62
US8758511B2Jun 24, 2014
Film forming apparatus and vaporizer
IIZUKA HACHISHIRO2 citations58
US9117633B2Aug 25, 2015
Plasma processing apparatus and processing gas supply structure thereof
IIZUKA HACHISHIRO1 citations51
US9196461B2Nov 24, 2015
Plasma processing apparatus
IIZUKA HACHISHIRO0 citations41
US8221581B2Jul 17, 2012
Gas supply mechanism and substrate processing apparatus
IIZUKA HACHISHIRO0 citations41
TOKYO ELECTRON LTD
13 patentsUS8366828B2Feb 5, 2013
Shower head and substrate processing apparatus
TOKYO ELECTRON LTD19 citations84
US7666260B2Feb 23, 2010
Vaporizer and semiconductor processing apparatus
TOKYO ELECTRON LTD9 citations84
US7513954B2Apr 7, 2009
Plasma processing apparatus and substrate mounting table employed therein
TOKYO ELECTRON LTD4 citations63
US8043471B2Oct 25, 2011
Plasma processing apparatus
TOKYO ELECTRON LTD2 citations62
US7413611B2Aug 19, 2008
Gas reaction system and semiconductor processing apparatus
TOKYO ELECTRON LTD5 citations62
US7232502B2Jun 19, 2007
Sheet-fed treating device
TOKYO ELECTRON LTD4 citations62
US12463084B2Nov 4, 2025
Shower head and substrate processing apparatus
TOKYO ELECTRON LTD0 citations52
US11621151B2Apr 4, 2023
Upper electrode and plasma processing apparatus
TOKYO ELECTRON LTD0 citations52
US11414754B2Aug 16, 2022
Film forming apparatus
TOKYO ELECTRON LTD0 citations52
US9807862B2Oct 31, 2017
Plasma processing apparatus
TOKYO ELECTRON LTD1 citations52
US11476132B2Oct 18, 2022
Sealing structure, vacuum processing apparatus and sealing method
TOKYO ELECTRON LTD0 citations50
US8052364B2Nov 8, 2011
Coupling member and plasma processing apparatus
TOKYO ELECTRON LTD0 citations48
USD581012SNov 18, 2008
Middle plate for the shower head
TOKYO ELECTRON LTD1 citations48