Inventor
ISHIHARA YOSHIO
JP26 patents
⚠️ This page may combine multiple inventors who share the name “ISHIHARA YOSHIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIPPON OXYGEN CO LTD
14 patentsUS6343239B1Jan 29, 2002
Transportation method for substrate wafers and transportation apparatus
NIPPON OXYGEN CO LTD360 citations99
US5953591ASep 14, 1999
Process for laser detection of gas and contaminants in a wafer transport gas tunnel
NIPPON OXYGEN CO LTD217 citations99
US6217633B1Apr 17, 2001
Method and apparatus for recovering rare gas
NIPPON OXYGEN CO LTD51 citations96
US6240610B1Jun 5, 2001
Wafer and transport system
NIPPON OXYGEN CO LTD18 citations92
US6605134B2Aug 12, 2003
Method and apparatus for collecting rare gas
NIPPON OXYGEN CO LTD29 citations91
US5821537AOct 13, 1998
Infrared spectroscopic analysis method for gases and device employing the method therein
NIPPON OXYGEN CO LTD33 citations91
US5703365ADec 30, 1997
Infrared spectroscopic analysis method for gases and device employing the method therein
NIPPON OXYGEN CO LTD23 citations91
US6040915AMar 21, 2000
Analysis method for gases and apparatus therefor
NIPPON OXYGEN CO LTD40 citations90
US6519039B1Feb 11, 2003
Gas spectrochemical analyzer, and spectrochemical analyzing method
NIPPON OXYGEN CO LTD24 citations89
US5766321AJun 16, 1998
Apparatus for reducing dissolved oxygen
NIPPON OXYGEN CO LTD31 citations89
US5759214AJun 2, 1998
Nitrogen gas supply system
NIPPON OXYGEN CO LTD9 citations74
US6312328B1Nov 6, 2001
System and method for producing and supplying highly clean dry air
NIPPON OXYGEN CO LTD12 citations69
US6869579B2Mar 22, 2005
Process for treating exhaust gas
NIPPON OXYGEN CO LTD4 citations63
US6375911B1Apr 23, 2002
Method and device for treating exhaust gas
NIPPON OXYGEN CO LTD4 citations62
MITSUBISHI MATERIAL SILICON
4 patentsUS7033843B2Apr 25, 2006
Semiconductor manufacturing method and semiconductor manufacturing apparatus
MITSUBISHI MATERIAL SILICON22 citations92
US6491758B1Dec 10, 2002
CVD apparatus equipped with moisture monitoring
MITSUBISHI MATERIAL SILICON11 citations73
US6776805B2Aug 17, 2004
Semiconductor manufacturing apparatus having a moisture measuring device
MITSUBISHI MATERIAL SILICON2 citations62
US6794204B2Sep 21, 2004
Semiconductor manufacturing method and semiconductor manufacturing apparatus
MITSUBISHI MATERIAL SILICON0 citations51
TAIYO NIPPON SANSO CORP
3 patentsUS7258725B2Aug 21, 2007
Gas supplying method and system
TAIYO NIPPON SANSO CORP67 citations98
US7594955B2Sep 29, 2009
Process for recovering rare gases using gas-recovering container
TAIYO NIPPON SANSO CORP6 citations63
US6887721B2May 3, 2005
Method of purging CVD apparatus and method for judging maintenance of times of semiconductor production apparatuses
TAIYO NIPPON SANSO CORP2 citations62