Inventor
KAUFMAN VLASTA BRUSIC
US21 patents
⚠️ This page may combine multiple inventors who share the name “KAUFMAN VLASTA BRUSIC”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CABOT MICROELECTRONICS CORP
14 patentsUS6217416B1Apr 17, 2001
Chemical mechanical polishing slurry useful for copper/tantalum substrates
CABOT MICROELECTRONICS CORP202 citations99
US6126853AOct 3, 2000
Chemical mechanical polishing slurry useful for copper substrates
CABOT MICROELECTRONICS CORP116 citations99
US6593239B2Jul 15, 2003
Chemical mechanical polishing method useful for copper substrates
CABOT MICROELECTRONICS CORP56 citations96
US6432828B2Aug 13, 2002
Chemical mechanical polishing slurry useful for copper substrates
CABOT MICROELECTRONICS CORP58 citations96
US6620037B2Sep 16, 2003
Chemical mechanical polishing slurry useful for copper substrates
CABOT MICROELECTRONICS CORP80 citations95
US6840971B2Jan 11, 2005
Chemical mechanical polishing systems and methods for their use
CABOT MICROELECTRONICS CORP30 citations93
US6316366B1Nov 13, 2001
Method of polishing using multi-oxidizer slurry
CABOT MICROELECTRONICS CORP36 citations93
US6867140B2Mar 15, 2005
Method of polishing a multi-layer substrate
CABOT MICROELECTRONICS CORP20 citations92
US6855266B1Feb 15, 2005
Polishing system with stopping compound and method of its use
CABOT MICROELECTRONICS CORP26 citations92
US6852632B2Feb 8, 2005
Method of polishing a multi-layer substrate
CABOT MICROELECTRONICS CORP33 citations92
US6569350B2May 27, 2003
Chemical mechanical polishing slurry useful for copper substrates
CABOT MICROELECTRONICS CORP23 citations92
US6362106B1Mar 26, 2002
Chemical mechanical polishing method useful for copper substrates
CABOT MICROELECTRONICS CORP25 citations92
US6309560B1Oct 30, 2001
Chemical mechanical polishing slurry useful for copper substrates
CABOT MICROELECTRONICS CORP41 citations92
US7381648B2Jun 3, 2008
Chemical mechanical polishing slurry useful for copper substrates
CABOT MICROELECTRONICS CORP7 citations74
CABOT CORP
6 patentsUS6063306AMay 16, 2000
Chemical mechanical polishing slurry useful for copper/tantalum substrate
CABOT CORP372 citations99
US5954997ASep 21, 1999
Chemical mechanical polishing slurry useful for copper substrates
CABOT CORP480 citations99
US5783489AJul 21, 1998
Multi-oxidizer slurry for chemical mechanical polishing
CABOT CORP263 citations99
US5858813AJan 12, 1999
Chemical mechanical polishing slurry for metal layers and films
CABOT CORP320 citations98
US6039891AMar 21, 2000
Multi-oxidizer precursor for chemical mechanical polishing
CABOT CORP57 citations96
US6033596AMar 7, 2000
Multi-oxidizer slurry for chemical mechanical polishing
CABOT CORP52 citations96