Inventor
IWATA TERUO
JP24 patents
⚠️ This page may combine multiple inventors who share the name “IWATA TERUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
21 patentsUS5382311AJan 17, 1995
Stage having electrostatic chuck and plasma processing apparatus using same
TOKYO ELECTRON LTD1,031 citations98
US5314541AMay 24, 1994
Reduced pressure processing system and reduced pressure processing method
TOKYO ELECTRON LTD127 citations98
US7718930B2May 18, 2010
Loading table and heat treating apparatus having the loading table
TOKYO ELECTRON LTD380 citations97
US6436193B1Aug 20, 2002
Gas processing apparatus baffle member, and gas processing method
TOKYO ELECTRON LTD262 citations97
US5240556AAug 31, 1993
Surface-heating apparatus and surface-treating method
TOKYO ELECTRON LTD75 citations96
US5753891AMay 19, 1998
Treatment apparatus
TOKYO ELECTRON LTD74 citations95
US5455082AOct 3, 1995
Reduced pressure processing system and reduced pressure processing method
TOKYO ELECTRON LTD69 citations95
US6149729ANov 21, 2000
Film forming apparatus and method
TOKYO ELECTRON LTD34 citations92
US5879139AMar 9, 1999
Vacuum pump with gas heating
TOKYO ELECTRON LTD41 citations92
US5433780AJul 18, 1995
Vacuum processing apparatus and exhaust system that prevents particle contamination
TOKYO ELECTRON LTD36 citations92
US5426865AJun 27, 1995
Vacuum creating method and apparatus
TOKYO ELECTRON LTD38 citations92
US7931749B2Apr 26, 2011
Shower head and film-forming device using the same
TOKYO ELECTRON LTD30 citations91
US5783492AJul 21, 1998
Plasma processing method, plasma processing apparatus, and plasma generating apparatus
TOKYO ELECTRON LTD50 citations91
US5133561AJul 28, 1992
Sealing device
TOKYO ELECTRON LTD68 citations91
US6372048B1Apr 16, 2002
Gas processing apparatus for object to be processed
TOKYO ELECTRON LTD17 citations89
US6719272B1Apr 13, 2004
Valve and vacuum processing device with the valve
TOKYO ELECTRON LTD11 citations74
US5198755AMar 30, 1993
Probe apparatus
TOKYO ELECTRON LTD17 citations74
US6253029B1Jun 26, 2001
Vacuum processing apparatus
TOKYO ELECTRON LTD5 citations73
US6669784B2Dec 30, 2003
Gas processing apparatus for object to be processed
TOKYO ELECTRON LTD11 citations71
US7238238B2Jul 3, 2007
Gasification monitor, method for detecting mist, film forming method and film forming apparatus
TOKYO ELECTRON LTD3 citations63
US7887873B2Feb 15, 2011
Gasification monitor, method for detecting mist, film forming method and film forming apparatus
TOKYO ELECTRON LTD0 citations52