Inventor
MIYAJIMA HIDESHI
JP36 patents
⚠️ This page may combine multiple inventors who share the name “MIYAJIMA HIDESHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
33 patentsUS7842518B2Nov 30, 2010
Method for fabricating semiconductor device
TOSHIBA KK535 citations99
US5731634AMar 24, 1998
Semiconductor device having a metal film formed in a groove in an insulating film
TOSHIBA KK102 citations98
US6164295ADec 26, 2000
CVD apparatus with high throughput and cleaning method therefor
TOSHIBA KK79 citations96
US5561082AOct 1, 1996
Method for forming an electrode and/or wiring layer by reducing copper oxide or silver oxide
TOSHIBA KK44 citations96
US6051508AApr 18, 2000
Manufacturing method of semiconductor device
TOSHIBA KK81 citations94
US5851842ADec 22, 1998
Measurement system and measurement method
TOSHIBA KK86 citations94
US7329601B2Feb 12, 2008
Method of manufacturing semiconductor device
TOSHIBA KK21 citations92
US6746969B2Jun 8, 2004
Method of manufacturing semiconductor device
TOSHIBA KK27 citations92
US6703302B2Mar 9, 2004
Method of making a low dielectric insulation layer
TOSHIBA KK19 citations92
US6344420B1Feb 5, 2002
Plasma processing method and plasma processing apparatus
TOSHIBA KK44 citations92
US6153509ANov 28, 2000
Method of manufacturing a semiconductor device
TOSHIBA KK22 citations92
US5424246AJun 13, 1995
Method of manufacturing semiconductor metal wiring layer by reduction of metal oxide
TOSHIBA KK52 citations92
US6558747B2May 6, 2003
Method of forming insulating film and process for producing semiconductor device
TOSHIBA KK19 citations91
US6534870B1Mar 18, 2003
Apparatus and method for manufacturing a semiconductor device
TOSHIBA KK32 citations91
US7999356B2Aug 16, 2011
Composition for film formation, insulating film, semiconductor device, and process for producing the semiconductor device
TOSHIBA KK11 citations84
US6614096B2Sep 2, 2003
Method for manufacturing a semiconductor device and a semiconductor device
TOSHIBA KK15 citations84
US7795142B2Sep 14, 2010
Method for fabricating a semiconductor device
TOSHIBA KK8 citations82
US5885352AMar 23, 1999
Vapor phase processing apparatus
TOSHIBA KK12 citations74
US6962870B2Nov 8, 2005
Method of manufacturing semiconductor device and semiconductor device
TOSHIBA KK9 citations73
US7589014B2Sep 15, 2009
Semiconductor device having multiple wiring layers and method of producing the same
TOSHIBA KK1 citations63
US6784092B2Aug 31, 2004
Method of forming insulating film and method of manufacturing semiconductor device
TOSHIBA KK2 citations63
US6737363B2May 18, 2004
Method of manufacturing semiconductor device
TOSHIBA KK3 citations63
US6436849B1Aug 20, 2002
Method for manufacturing semiconductor device having low dielectric constant insulating film, wafer processing equipment and wafer storing box used in this method
TOSHIBA KK5 citations63
US7154179B2Dec 26, 2006
Semiconductor device
TOSHIBA KK4 citations62
US7094681B2Aug 22, 2006
Semiconductor device fabrication method
TOSHIBA KK5 citations62
US7569498B2Aug 4, 2009
Manufacturing method of semiconductor device
TOSHIBA KK2 citations61
US6458713B1Oct 1, 2002
Method for manufacturing semiconductor device
TOSHIBA KK5 citations60
US8008190B2Aug 30, 2011
Method of manufacturing semiconductor device
TOSHIBA KK1 citations52
US7855141B2Dec 21, 2010
Semiconductor device having multiple wiring layers and method of producing the same
TOSHIBA KK0 citations52
US7745326B2Jun 29, 2010
Semiconductor device having multiple wiring layers and method of producing the same
TOSHIBA KK0 citations52
US7199038B2Apr 3, 2007
Method for fabricating semiconductor device
TOSHIBA KK1 citations52
US7534717B2May 19, 2009
Method of manufacturing semiconductor device
TOSHIBA KK0 citations51
US7462569B2Dec 9, 2008
Method of manufacturing semiconductor device
TOSHIBA KK0 citations51