Inventor
OGATA KUNIE
JP36 patents
⚠️ This page may combine multiple inventors who share the name “OGATA KUNIE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
30 patentsUS5968691AOct 19, 1999
Method and apparatus for coating resist and developing the coated resist
TOKYO ELECTRON LTD93 citations98
US6313903B1Nov 6, 2001
Resist coating and developing unit
TOKYO ELECTRON LTD73 citations96
US6266125B1Jul 24, 2001
Resist processing method and apparatus
TOKYO ELECTRON LTD57 citations96
US6051349AApr 18, 2000
Apparatus for coating resist and developing the coated resist
TOKYO ELECTRON LTD60 citations96
US5939130AAug 17, 1999
Coating film forming method and coating film forming apparatus
TOKYO ELECTRON LTD84 citations94
US6541170B2Apr 1, 2003
Resist processing method controlled through reflectivity data
TOKYO ELECTRON LTD19 citations93
US6431769B1Aug 13, 2002
Substrate processing system and substrate processing method
TOKYO ELECTRON LTD26 citations93
US7780366B2Aug 24, 2010
Resist pattern forming method
TOKYO ELECTRON LTD22 citations92
US7488127B2Feb 10, 2009
Resist pattern forming apparatus and method thereof
TOKYO ELECTRON LTD16 citations92
US6984477B2Jan 10, 2006
Resist pattern forming apparatus and method thereof
TOKYO ELECTRON LTD25 citations92
US6457882B2Oct 1, 2002
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD19 citations92
US6221787B1Apr 24, 2001
Apparatus and method of forming resist film
TOKYO ELECTRON LTD43 citations92
US5845170ADec 1, 1998
Developing method
TOKYO ELECTRON LTD43 citations92
US7968825B2Jun 28, 2011
Temperature setting method of thermal processing plate, computer-readable recording medium recording program thereon, and temperature setting apparatus for thermal processing plate
TOKYO ELECTRON LTD29 citations91
US6281962B1Aug 28, 2001
Processing apparatus for coating substrate with resist and developing exposed resist including inspection equipment for inspecting substrate and processing method thereof
TOKYO ELECTRON LTD52 citations91
US6593045B2Jul 15, 2003
Substrate processing apparatus and method
TOKYO ELECTRON LTD38 citations90
US6713120B2Mar 30, 2004
Substrate processing system and substrate processing method
TOKYO ELECTRON LTD13 citations84
US6990380B2Jan 24, 2006
Substrate processing apparatus and information storage apparatus and method
TOKYO ELECTRON LTD8 citations73
US8041525B2Oct 18, 2011
Substrate measuring method, computer-readable recording medium recording program thereon, and substrate measuring system
TOKYO ELECTRON LTD2 citations62
US7985516B2Jul 26, 2011
Substrate processing method, computer-readable storage medium and substrate processing system
TOKYO ELECTRON LTD2 citations62
US7968260B2Jun 28, 2011
Substrate processing method, computer-readable storage medium, and substrate processing system
TOKYO ELECTRON LTD4 citations62
US7957828B2Jun 7, 2011
Temperature setting method for thermal processing plate, temperature setting apparatus for thermal processing plate, and computer-readable storage medium
TOKYO ELECTRON LTD6 citations62
US7867673B2Jan 11, 2011
Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program
TOKYO ELECTRON LTD4 citations62
US7862966B2Jan 4, 2011
Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program
TOKYO ELECTRON LTD2 citations62
US7822574B2Oct 26, 2010
Substrate measuring method, computer-readable recording medium recording program thereon, and substrate processing system
TOKYO ELECTRON LTD2 citations62
US7031792B2Apr 18, 2006
Processing apparatus and information storage apparatus and method
TOKYO ELECTRON LTD4 citations62
US7897896B2Mar 1, 2011
Temperature setting method of thermal processing plate, computer-readable recording medium recording program thereon, and temperature setting apparatus for thermal processing plate
TOKYO ELECTRON LTD2 citations61
US6394670B2May 28, 2002
Parts maintenance managing system
TOKYO ELECTRON LTD4 citations60
US7884950B2Feb 8, 2011
Substrate processing method, program, computer-readable storage medium, and substrate processing system
TOKYO ELECTRON LTD0 citations51
US7867674B2Jan 11, 2011
Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program
TOKYO ELECTRON LTD0 citations41