Inventor
HAZELTON ANDREW J
US98 patents
⚠️ This page may combine multiple inventors who share the name “HAZELTON ANDREW J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
46 patentsUS7321415B2Jan 22, 2008
Environmental system including vacuum scavenge for an immersion lithography apparatus
NIKON CORP63 citations99
US7251017B2Jul 31, 2007
Environmental system including a transport region for an immersion lithography apparatus
NIKON CORP65 citations99
US6437463B1Aug 20, 2002
Wafer positioner with planar motor and mag-lev fine stage
NIKON CORP135 citations99
US6285097B1Sep 4, 2001
Planar electric motor and positioning device having transverse magnets
NIKON CORP172 citations99
US7522259B2Apr 21, 2009
Cleanup method for optics in immersion lithography
NIKON CORP71 citations98
US6570273B2May 27, 2003
Electric linear motor
NIKON CORP84 citations98
US6313551B1Nov 6, 2001
Magnet array for a shaft-type linear motor
NIKON CORP120 citations98
US6271606B1Aug 7, 2001
Driving motors attached to a stage that are magnetically coupled through a chamber
NIKON CORP96 citations98
US6208045B1Mar 27, 2001
Electric motors and positioning devices having moving magnet arrays and six degrees of freedom
NIKON CORP118 citations98
US6188147B1Feb 13, 2001
Wedge and transverse magnet arrays
NIKON CORP86 citations98
US6104108AAug 15, 2000
Wedge magnet array for linear motor
NIKON CORP137 citations98
US6097114AAug 1, 2000
Compact planar motor having multiple degrees of freedom
NIKON CORP118 citations98
US6114781ASep 5, 2000
Cooling system for a linear or planar motor
NIKON CORP96 citations97
US7486380B2Feb 3, 2009
Wafer table for immersion lithography
NIKON CORP46 citations96
US7456930B2Nov 25, 2008
Environmental system including vacuum scavenge for an immersion lithography apparatus
NIKON CORP51 citations96
US7339650B2Mar 4, 2008
Immersion lithography fluid control system that applies force to confine the immersion liquid
NIKON CORP46 citations96
US7301607B2Nov 27, 2007
Wafer table for immersion lithography
NIKON CORP48 citations96
US6323567B1Nov 27, 2001
Circulating system for shaft-type linear motors
NIKON CORP63 citations96
US6252234B1Jun 26, 2001
Reaction force isolation system for a planar motor
NIKON CORP55 citations96
US6163091ADec 19, 2000
Linear motor with commutation coil
NIKON CORP66 citations96
US6144119ANov 7, 2000
Planar electric motor with dual coil and magnet arrays
NIKON CORP71 citations96
US6788385B2Sep 7, 2004
Stage device, exposure apparatus and method
NIKON CORP82 citations95
US7345742B2Mar 18, 2008
Environmental system including a transport region for an immersion lithography apparatus
NIKON CORP43 citations94
US7932989B2Apr 26, 2011
Liquid jet and recovery system for immersion lithography
NIKON CORP11 citations93
US7929111B2Apr 19, 2011
Environmental system including a transport region for an immersion lithography apparatus
NIKON CORP10 citations93
US7443482B2Oct 28, 2008
Liquid jet and recovery system for immersion lithography
NIKON CORP27 citations93
US7164466B2Jan 16, 2007
Detachable heat sink
NIKON CORP22 citations93
US6750625B2Jun 15, 2004
Wafer stage with magnetic bearings
NIKON CORP38 citations93
US6724466B2Apr 20, 2004
Stage assembly including a damping assembly
NIKON CORP19 citations93
US6486941B1Nov 26, 2002
Guideless stage
NIKON CORP28 citations93
US6355993B1Mar 12, 2002
Linear motor having polygonal shaped coil units
NIKON CORP26 citations93
US7368838B2May 6, 2008
High efficiency voice coil motor
NIKON CORP30 citations92
US7095482B2Aug 22, 2006
Multiple system vibration isolator
NIKON CORP20 citations92
US6885430B2Apr 26, 2005
System and method for resetting a reaction mass assembly of a stage assembly
NIKON CORP43 citations92
US6880942B2Apr 19, 2005
Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system
NIKON CORP28 citations92
US6313550B1Nov 6, 2001
Coil mounting and cooling system for an electric motor
NIKON CORP40 citations92
US6278203B1Aug 21, 2001
Cooling structure for a linear motor
NIKON CORP42 citations92
US6147421ANov 14, 2000
Platform positionable in at least three degrees of freedom by interaction with coils
NIKON CORP44 citations92
US6373153B1Apr 16, 2002
Stage device, and exposure apparatus with linear motor having polygonal shaped coil units
NIKON CORP45 citations91
US7929110B2Apr 19, 2011
Environmental system including a transport region for an immersion lithography apparatus
NIKON CORP7 citations84
US7355308B2Apr 8, 2008
Mover combination with two circulation flows
NIKON CORP14 citations84
US7288859B2Oct 30, 2007
Wafer stage operable in a vacuum environment
NIKON CORP18 citations84
US7283210B2Oct 16, 2007
Image shift optic for optical system
NIKON CORP11 citations84
US6958808B2Oct 25, 2005
System and method for resetting a reaction mass assembly of a stage assembly
NIKON CORP15 citations84
US6757053B1Jun 29, 2004
Stage assembly including a reaction mass assembly
NIKON CORP15 citations84
US6551045B2Apr 22, 2003
Wafer stage chamber
NIKON CORP14 citations84
HAZELTON ANDREW J
2 patentsNIKON CORP OF JAPAN
1 patentNIPPON KOGAKU KK
1 patentShowing the top 50 of 98 patents by PatentIndex Score.