Inventor
OLUSEYI HAKEEM
US5 patents
Patents
5 patentsUS6633391B1Oct 14, 2003
Monitoring of film characteristics during plasma-based semi-conductor processing using optical emission spectroscopy
APPLIED MATERIALS INC57 citations95
US6603538B1Aug 5, 2003
Method and apparatus employing optical emission spectroscopy to detect a fault in process conditions of a semiconductor processing system
APPLIED MATERIALS INC36 citations91
US6579806B2Jun 17, 2003
Method of etching tungsten or tungsten nitride in semiconductor structures
APPLIED MATERIALS INC16 citations91
US6440870B1Aug 27, 2002
Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures
APPLIED MATERIALS INC28 citations91
US6423644B1Jul 23, 2002
Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures
APPLIED MATERIALS INC25 citations91