Inventor

CERNAT MIHAELA

US2 patents

Patents

2 patents

US7273060B2Sep 25, 2007

Methods for chemically treating a substrate using foam technology

EKC TECHNOLOGY INC16 citations81

US7479474B2Jan 20, 2009

Reducing oxide loss when using fluoride chemistries to remove post-etch residues in semiconductor processing

EKC TECHNOLOGY INC18 citations79