Inventor

GHINOVKER MARK

IL82 patents

⚠️ This page may combine multiple inventors who share the name “GHINOVKER MARK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GHINOVKER MARK

KLA TENCOR TECH CORP

Overlay marks, methods of overlay mark design and methods of overlay measurements

Apparatus and methods for providing in-chip microtargets for metrology or inspection

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for determining overlay and uses of same

Overlay marks and methods of manufacturing such marks

Apparatus and methods for determining overlay of structures having rotational or mirror symmetry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Overlay marks, methods of overlay mark design and methods of overlay measurements

Use of overlay diagnostics for enhanced automatic process control

Overlay marks, methods of overlay mark design and methods of overlay measurements

Overlay marks, methods of overlay mark design and methods of overlay measurements

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for determining overlay and uses of same

Overlay metrology and control method

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools

Apparatus and methods for detecting overlay errors using scatterometry

Method and mark for metrology of phase errors on phase shift masks

Use of overlay diagnostics for enhanced automatic process control

Measuring phase errors on phase shift masks

KLA TENCOR CORP

Overlay marks, methods of overlay mark design and methods of overlay measurements

Overlay marks, methods of overlay mark design and methods of overlay measurements

Apparatus and methods for detecting overlay errors using scatterometry

Overlay marks, methods of overlay mark design and methods of overlay measurements

Compound imaging metrology targets

Apodization for pupil imaging scatterometry

Apparatus for measuring overlay errors

Overlay metrology target

Overlay metrology target

Analyzing root causes of process variation in scatterometry metrology

Systems for providing illumination in optical metrology

Apparatus and methods for determining overlay of structures having rotational or mirror symmetry

Moiré target and method for using the same in measuring misregistration of semiconductor devices

Reducing algorithmic inaccuracy in scatterometry overlay metrology

Apodization for pupil imaging scatterometry

GHINOVKER MARK

Overlay marks, methods of overlay mark design and methods of overlay measurements

Apparatus and methods for determining overlay of structures having rotational or mirror symmetry

Apparatus and methods for determining overlay of structures having rotational or mirror symmetry

Thin overlay mark for imaging based metrology

KLA CORP

Metrology target for scanning metrology

Misregistration metrology by using fringe Moiré and optical Moiré effects

Device-like overlay metrology targets displaying Moiré effects

Single cell in-die metrology targets and measurement methods

KLA TENOCOR TECHNOLOGIES CORP

Overlay marks, methods of overlay mark design and methods of overlay measurements

LEVINSKI VLADIMIR

Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods