Inventor

ADEL MICHAEL E

IL44 patents

⚠️ This page may combine multiple inventors who share the name “ADEL MICHAEL E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADEL MICHAEL E

KLA TENCOR TECH CORP

Continuously varying offset mark and methods of determining overlay

Apparatus and methods for providing in-chip microtargets for metrology or inspection

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for determining overlay and uses of same

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Use of overlay diagnostics for enhanced automatic process control

Apparatus and methods for determining overlay and uses of same

Apparatus and methods for detecting overlay errors using scatterometry

Feature printability optimization by optical tool

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools

Apparatus and methods for detecting overlay errors using scatterometry

Cross hatched metrology marks and associated method of use

Use of overlay diagnostics for enhanced automatic process control

Target acquisition and overlay metrology based on two diffracted orders imaging

Use of overlay diagnostics for enhanced automatic process control

Methods and apparatus for designing and using micro-targets in overlay metrology

Method and system for optimizing alignment performance in a fleet of exposure tools

KLA TENCOR CORP

System method and structure for determining focus accuracy

On-device metrology

Analyzing root causes of process variation in scatterometry metrology

Process compatibility improvement by fill factor modulation

Determining the impacts of stochastic behavior on overlay metrology data

Overlay control with non-zero offset prediction

Feed forward of metrology data in a metrology system

Target and process sensitivity analysis to requirements

Verification metrology target and their design

On-product derivation and adjustment of exposure parameters in a directed self-assembly process

APPLIED SPECTRAL IMAGING LTD

Spectral imaging using illumination of preselected spectral content

Film thickness mapping using interferometric spectral imaging

C I SYSTEMS ISRAEL LTD

Multipoint temperature monitoring apparatus for semiconductor wafers during processing

Method and apparatus for measuring temperature

LEVINSKI VLADIMIR

Optical system

Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods

KLA CORP

Metrology target design for tilted device designs

Verification metrology targets and their design

C I SYSTEMS LTD

Temperature measuring method and apparatus

KLA TENCOR TECHNOLGIES CORP

Order selected overlay metrology

IZIKSON PAVEL

Substrate matrix to decouple tool and process effects