Inventor

GABOR ALLEN H

US40 patents

⚠️ This page may combine multiple inventors who share the name “GABOR ALLEN H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GABOR ALLEN H

IBM

Binary OPC for assist feature layout optimization

Registration mark formation during sidewall image transfer process

Binary OPC for assist feature layout optimization

Pitch-based subresolution assist feature design

Composite structures to prevent pattern collapse

Method for performing chemical shrink process over BARC (bottom anti-reflective coating)

Multi-layer chip overlay target and measurement

Registration mark formation during sidewall image transfer process

Polyconductor line end formation and related mask

Method for performing chemical shrink process over BARC (bottom anti-reflective coating)

Line ends forming

Multiple exposure lithography method incorporating intermediate layer patterning

Topography compensated film application methods

Methods for reducing within chip device parameter variations

Method and algorithm for the control of critical dimensions in a thermal flow process

Method for reducing within chip device parameter variations

Mask design for enhancing line end resolution

Multi-layer chip overlay target and measurement

Process of making a semiconductor device using multiple antireflective materials

Process of making a semiconductor device using multiple antireflective materials

Registration mark formation during sidewall image transfer process

Registration mark formation during sidewall image transfer process

Alignment marks for multi-exposure lithography

Polyconductor line end formation and related mask

GABOR ALLEN H

Alignment marks for multi-exposure lithography

Methods for forming a composite pattern including printed resolution assist features

Method for monitoring focus on an integrated wafer

CORNELL RES FOUNDATION INC

Bilayer resist and process for preparing same

Bilayer resist and process for preparing same

ANGELOPOULOS MARIE

Process of making a lithographic structure using antireflective materials

Process of making a lithographic structure using antireflective materials

BAILEY TODD CHRISTOPHER

Method for performing chemical shrink process over BARC (bottom anti-reflective coating)

Structure resulting from chemical shrink process over BARC (bottom anti-reflective coating)

ARCH SPEC CHEM INC

Radiation sensitive terpolymer, photoresist compositions thereof and 193 nm bilayer systems

AGERE SYST GUARDIAN CORP

Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material

RAGHUNATHAN SUDHARSHANAN

Sidewall image transfer process with multiple critical dimensions

INFINEON TECHNOLOGIES AG

Integrated circuits and methods of design and manufacture thereof

GLOBALFOUNDRIES INC

Method for calculating non-correctable EUV blank flatness for blank dispositioning

BURKHARDT MARTIN

Method of forming a semiconductor device having a cut-way hole to expose a portion of a hardmask layer

AUSSCHNITT CHRISTOPHER P

Alignment data based process control system