Inventor

YANG NENG-HUI

TW35 patents

Patents

35 patents

US6991991B2Jan 31, 2006

MOS device with epitaxial structure associated with source/drain region and method of forming the same

UNITED MICROELECTRONICS CORP14 citations83

US9859164B1Jan 2, 2018

Method for manufacturing fins

UNITED MICROELECTRONICS CORP5 citations82

US9722030B1Aug 1, 2017

Semiconductor device and manufacturing method thereof

UNITED MICROELECTRONICS CORP6 citations82

US9397214B1Jul 19, 2016

Semiconductor device

UNITED MICROELECTRONICS CORP10 citations82

US6653204B1Nov 25, 2003

Method of forming a shallow trench isolation structure

UNITED MICROELECTRONICS CORP13 citations80

US6387813B1May 14, 2002

Method for stripping a low dielectric film with high carbon content

UNITED MICROELECTRONICS CORP7 citations74

US6893909B2May 17, 2005

Method of manufacturing metal-oxide-semiconductor transistor

UNITED MICROELECTRONICS CORP8 citations73

US6406978B1Jun 18, 2002

Method of removing silicon carbide

UNITED MICROELECTRONICS CORP11 citations73

US9748386B2Aug 29, 2017

Epitaxial structure of semiconductor device and manufacturing method thereof

UNITED MICROELECTRONICS CORP2 citations72

US7071046B2Jul 4, 2006

Method of manufacturing a MOS transistor

UNITED MICROELECTRONICS CORP10 citations71

US7060547B2Jun 13, 2006

Method for forming a junction region of a semiconductor device

UNITED MICROELECTRONICS CORP2 citations62

US7306681B2Dec 11, 2007

Method of cleaning a semiconductor substrate

UNITED MICROELECTRONICS CORP3 citations61

US6827835B2Dec 7, 2004

Method for electroplated metal annealing process

UNITED MICROELECTRONICS CORP2 citations61

US6861104B2Mar 1, 2005

Method of enhancing adhesion strength of BSG film to silicon nitride film

UNITED MICROELECTRONICS CORP2 citations60

US6521545B1Feb 18, 2003

Method of a surface treatment on a fluorinated silicate glass film

UNITED MICROELECTRONICS CORP5 citations58

US9633904B1Apr 25, 2017

Method for manufacturing semiconductor device with epitaxial structure

UNITED MICROELECTRONICS CORP0 citations52

US9570578B2Feb 14, 2017

Gate and gate forming process

UNITED MICROELECTRONICS CORP1 citations52

US9530886B1Dec 27, 2016

Semiconductor device with epitaxial structure and manufacturing method thereof

UNITED MICROELECTRONICS CORP1 citations52

US7435658B2Oct 14, 2008

Method of manufacturing metal-oxide-semiconductor transistor

UNITED MICROELECTRONICS CORP1 citations52

US6596652B2Jul 22, 2003

Method of fabricating low dielectric constant film

UNITED MICROELECTRONICS CORP1 citations52

US10128366B2Nov 13, 2018

Field-effect transistor

UNITED MICROELECTRONICS CORP0 citations51

US9929264B2Mar 27, 2018

Field-effect transistor and method of making the same

UNITED MICROELECTRONICS CORP0 citations51

US9748147B1Aug 29, 2017

Method of fabricating epitaxial layer

UNITED MICROELECTRONICS CORP0 citations51

US9466480B2Oct 11, 2016

Cleaning process for oxide

UNITED MICROELECTRONICS CORP1 citations51

US11107689B2Aug 31, 2021

Method for fabricating semiconductor device

UNITED MICROELECTRONICS CORP0 citations50

US9966434B2May 8, 2018

Manufacturing method of semiconductor device

UNITED MICROELECTRONICS CORP0 citations50

US9947588B1Apr 17, 2018

Method for manufacturing fins

UNITED MICROELECTRONICS CORP0 citations50

US9966266B2May 8, 2018

Apparatus for semiconductor wafer treatment and semiconductor wafer treatment

UNITED MICROELECTRONICS CORP0 citations41

YANG NENG-HUI

Patents

Method for preventing to form a spacer undercut in SEG pre-clean process

Method for depositing silicon carbide in semiconductor devices

Field-effect transistor and method of making the same

MOS transistor having reduced source/drain extension sheet resistance

Bilayer silicon carbide based barrier

Method of manufacturing metal-oxide-semiconductor transistor

Method of forming a thin film on a semiconductor wafer

MOS device with epitaxial structure associated with source/drain region and method of forming the same

Method for manufacturing fins

Semiconductor device and manufacturing method thereof

Semiconductor device

Method of forming a shallow trench isolation structure

Method for stripping a low dielectric film with high carbon content

Method of manufacturing metal-oxide-semiconductor transistor

Method of removing silicon carbide

Epitaxial structure of semiconductor device and manufacturing method thereof

Method of manufacturing a MOS transistor

Method for forming a junction region of a semiconductor device

Method of cleaning a semiconductor substrate

Method for electroplated metal annealing process

Method of enhancing adhesion strength of BSG film to silicon nitride film

Method of a surface treatment on a fluorinated silicate glass film

Method for manufacturing semiconductor device with epitaxial structure

Gate and gate forming process

Semiconductor device with epitaxial structure and manufacturing method thereof

Method of manufacturing metal-oxide-semiconductor transistor

Method of fabricating low dielectric constant film

Field-effect transistor

Field-effect transistor and method of making the same

Method of fabricating epitaxial layer

Cleaning process for oxide

Method for fabricating semiconductor device

Manufacturing method of semiconductor device

Method for manufacturing fins

Apparatus for semiconductor wafer treatment and semiconductor wafer treatment