Inventor
OWA SOICHI
JP91 patents
⚠️ This page may combine multiple inventors who share the name “OWA SOICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
37 patentsUS7483119B2Jan 27, 2009
Exposure method, substrate stage, exposure apparatus, and device manufacturing method
NIKON CORP76 citations99
US7388649B2Jun 17, 2008
Exposure apparatus and method for producing device
NIKON CORP121 citations99
US7023610B2Apr 4, 2006
Ultraviolet laser apparatus and exposure apparatus using same
NIKON CORP495 citations99
US6590698B1Jul 8, 2003
Ultraviolet laser apparatus and exposure apparatus using same
NIKON CORP162 citations99
US7589820B2Sep 15, 2009
Exposure apparatus and method for producing device
NIKON CORP49 citations96
US7542128B2Jun 2, 2009
Exposure apparatus, exposure method, and method for producing device
NIKON CORP46 citations96
US6970228B1Nov 29, 2005
Exposure method and system
NIKON CORP63 citations96
US6088379AJul 11, 2000
Ultraviolet laser apparatus and semiconductor exposure apparatus
NIKON CORP59 citations96
US5838709ANov 17, 1998
Ultraviolet laser source
NIKON CORP90 citations96
US7098992B2Aug 29, 2006
Light source unit and wavelength stabilizing control method, exposure apparatus and exposure method, method of making exposure apparatus, and device manufacturing method and device
NIKON CORP90 citations95
US7453550B2Nov 18, 2008
Exposure apparatus, exposure method, and method for producing device
NIKON CORP35 citations94
US7050149B2May 23, 2006
Exposure apparatus and exposure method
NIKON CORP48 citations93
US6707529B1Mar 16, 2004
Exposure method and apparatus
NIKON CORP39 citations93
US6653024B1Nov 25, 2003
Photomask, aberration correction plate, exposure apparatus, and process of production of microdevice
NIKON CORP36 citations93
US6614504B2Sep 2, 2003
Exposure apparatus, exposure method, and device manufacturing method
NIKON CORP31 citations93
US6324203B1Nov 27, 2001
Laser light source, illuminating optical device, and exposure device
NIKON CORP37 citations93
US6831731B2Dec 14, 2004
Projection optical system and an exposure apparatus with the projection optical system
NIKON CORP45 citations92
US6339634B1Jan 15, 2002
Soft x-ray light source device
NIKON CORP47 citations92
US5851707ADec 22, 1998
Microlithography projection-exposure masks, and methods and apparatus employing same
NIKON CORP22 citations92
US5847812ADec 8, 1998
Projection exposure system and method
NIKON CORP33 citations92
US6291145B1Sep 18, 2001
Image formation method with photosensitive material
NIKON CORP29 citations90
US8760617B2Jun 24, 2014
Exposure apparatus and method for producing device
NIKON CORP4 citations84
US6049558AApr 11, 2000
Optical elements for guiding laser light and laser systems comprising same
NIKON CORP19 citations84
US8384877B2Feb 26, 2013
Exposure apparatus and method for producing device
NIKON CORP4 citations74
US8040491B2Oct 18, 2011
Exposure method, substrate stage, exposure apparatus, and device manufacturing method
NIKON CORP4 citations74
US7277220B2Oct 2, 2007
Ultraviolet laser apparatus and exposure apparatus using same
NIKON CORP4 citations74
US7126745B2Oct 24, 2006
Method of irradiating ultraviolet light onto an object
NIKON CORP4 citations74
US6844915B2Jan 18, 2005
Optical system and exposure apparatus provided with the optical system
NIKON CORP10 citations74
US6078598AJun 20, 2000
Laser apparatus, pulsed laser oscillation method and projection exposure apparatus using the same
NIKON CORP12 citations74
US5902716AMay 11, 1999
Exposure method and apparatus
NIKON CORP16 citations74
US5875031AFeb 23, 1999
Distance measuring device based on laser interference with a baffle structure member
NIKON CORP12 citations74
US10761431B2Sep 1, 2020
Spatial light modulator, method of driving same, and exposure method and apparatus
NIKON CORP2 citations73
US10261421B2Apr 16, 2019
Controller for optical device, exposure method and apparatus, and method for manufacturing device
NIKON CORP1 citations73
US9946162B2Apr 17, 2018
Controller for optical device, exposure method and apparatus, and method for manufacturing device
NIKON CORP2 citations73
US9651871B2May 16, 2017
Spatial light modulator, exposure apparatus, and method for manufacturing device
NIKON CORP3 citations73
US9551942B2Jan 24, 2017
Controller for optical device, exposure method and apparatus, and method for manufacturing device
NIKON CORP3 citations73
US10527956B2Jan 7, 2020
Temperature controlled heat transfer frame for pellicle
NIKON CORP4 citations72
OWA SOICHI
6 patentsUS8792081B2Jul 29, 2014
Controller for optical device, exposure method and apparatus, and method for manufacturing device
OWA SOICHI19 citations92
US8089616B2Jan 3, 2012
Pattern forming method and apparatus, exposure method and apparatus, and device manufacturing method and device
OWA SOICHI17 citations92
US9291814B2Mar 22, 2016
Spatial light modulator, exposure apparatus, and method for manufacturing device
OWA SOICHI9 citations84
US8094290B2Jan 10, 2012
Illumination optical apparatus, exposure apparatus, and device manufacturing method
OWA SOICHI12 citations84
US9310520B2Apr 12, 2016
Optical material, optical element, and method for manufacturing same
OWA SOICHI6 citations82
US9239525B2Jan 19, 2016
Pattern forming method and apparatus, exposure method and apparatus, and device manufacturing method and device
OWA SOICHI3 citations73
KOBAYASHI NAOYUKI
4 patentsUS8174668B2May 8, 2012
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI11 citations92
US8169592B2May 1, 2012
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI4 citations74
US8130363B2Mar 6, 2012
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI4 citations74
US8072576B2Dec 6, 2011
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI4 citations74
IBM
1 patentNAGASAKA HIROYUKI
1 patentWATANABE YOJI
1 patentShowing the top 50 of 91 patents by PatentIndex Score.