P

Inventor

KNALL N JOHAN

US41 patents
⚠️ This page may combine multiple inventors who share the name “KNALL N JOHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MATRIX SEMICONDUCTOR INC

21 patents
US6952043B2Oct 4, 2005

Electrically isolated pillars in active devices

MATRIX SEMICONDUCTOR INC218 citations99
US6888750B2May 3, 2005

Nonvolatile memory on SOI and compound semiconductor substrates and method of fabrication

MATRIX SEMICONDUCTOR INC497 citations99
US6822903B2Nov 23, 2004

Apparatus and method for disturb-free programming of passive element memory cells

MATRIX SEMICONDUCTOR INC118 citations99
US6653712B2Nov 25, 2003

Three-dimensional memory array and method of fabrication

MATRIX SEMICONDUCTOR INC197 citations99
US6631085B2Oct 7, 2003

Three-dimensional memory array incorporating serial chain diode stack

MATRIX SEMICONDUCTOR INC278 citations99
US6627530B2Sep 30, 2003

Patterning three dimensional structures

MATRIX SEMICONDUCTOR INC385 citations99
US6541312B2Apr 1, 2003

Formation of antifuse structure in a three dimensional memory

MATRIX SEMICONDUCTOR INC121 citations99
US6515888B2Feb 4, 2003

Low cost three-dimensional memory array

MATRIX SEMICONDUCTOR INC232 citations99
US6420215B1Jul 16, 2002

Three-dimensional memory array and method of fabrication

MATRIX SEMICONDUCTOR INC1,212 citations99
US7022572B2Apr 4, 2006

Manufacturing method for integrated circuit having disturb-free programming of passive element memory cells

MATRIX SEMICONDUCTOR INC71 citations98
US6954394B2Oct 11, 2005

Integrated circuit and method for selecting a set of memory-cell-layer-dependent or temperature-dependent operating conditions

MATRIX SEMICONDUCTOR INC71 citations98
US6777773B2Aug 17, 2004

Memory cell with antifuse layer formed at diode junction

MATRIX SEMICONDUCTOR INC109 citations98
US6704235B2Mar 9, 2004

Anti-fuse memory cell with asymmetric breakdown voltage

MATRIX SEMICONDUCTOR INC81 citations98
US6486065B2Nov 26, 2002

Method of forming nonvolatile memory device utilizing a hard mask

MATRIX SEMICONDUCTOR INC107 citations98
US6490218B1Dec 3, 2002

Digital memory method and system for storing multiple bit digital data

MATRIX SEMICONDUCTOR INC71 citations96
US6963504B2Nov 8, 2005

Apparatus and method for disturb-free programming of passive element memory cells

MATRIX SEMICONDUCTOR INC18 citations93
US6767816B2Jul 27, 2004

Method for making a three-dimensional memory array incorporating serial chain diode stack

MATRIX SEMICONDUCTOR INC27 citations93
US6642603B1Nov 4, 2003

Same conductivity type highly-doped regions for antifuse memory cell

MATRIX SEMICONDUCTOR INC43 citations93
US6770939B2Aug 3, 2004

Thermal processing for three dimensional circuits

MATRIX SEMICONDUCTOR INC13 citations84
US6768185B2Jul 27, 2004

Formation of antifuse structure in a three dimensional memory

MATRIX SEMICONDUCTOR INC8 citations74
US6624011B1Sep 23, 2003

Thermal processing for three dimensional circuits

MATRIX SEMICONDUCTOR INC11 citations74

CANDESCENT TECH CORP

13 patents
US6004180ADec 21, 1999

Cleaning of electron-emissive elements

CANDESCENT TECH CORP58 citations95
US6019658AFeb 1, 2000

Fabrication of gated electron-emitting device utilizing distributed particles to define gate openings, typically in combination with spacer material to control spacing between gate layer and electron-emissive elements

CANDESCENT TECH CORP17 citations93
US6007695ADec 28, 1999

Selective removal of material using self-initiated galvanic activity in electrolytic bath

CANDESCENT TECH CORP41 citations93
US5920151AJul 6, 1999

Structure and fabrication of electron-emitting device having focus coating contacted through underlying access conductor

CANDESCENT TECH CORP26 citations92
US6187603B1Feb 13, 2001

Fabrication of gated electron-emitting devices utilizing distributed particles to define gate openings, typically in combination with lift-off of excess emitter material

CANDESCENT TECH CORP15 citations84
US6008062ADec 28, 1999

Undercutting technique for creating coating in spaced-apart segments

CANDESCENT TECH CORP17 citations84
US6013986AJan 11, 2000

Electron-emitting device having multi-layer resistor

CANDESCENT TECH CORP17 citations83
US5863233AJan 26, 1999

Field emitter fabrication using open circuit electrochemical lift off

CANDESCENT TECH CORP17 citations83
US6013974AJan 11, 2000

Electron-emitting device having focus coating that extends partway into focus openings

CANDESCENT TECH CORP11 citations74
US5865659AFeb 2, 1999

Fabrication of gated electron-emitting device utilizing distributed particles to define gate openings and utilizing spacer material to control spacing between gate layer and electron-emissive elements

CANDESCENT TECH CORP14 citations74
US5893967AApr 13, 1999

Impedance-assisted electrochemical removal of material, particularly excess emitter material in electron-emitting device

CANDESCENT TECH CORP8 citations72
US6010383AJan 4, 2000

Protection of electron-emissive elements prior to removing excess emitter material during fabrication of electron-emitting device

CANDESCENT TECH CORP6 citations63
US6027632AFeb 22, 2000

Multi-step removal of excess emitter material in fabricating electron-emitting device

CANDESCENT TECH CORP3 citations59

SANDISK 3D LLC

5 patents

SANDISK CORP

1 patent

JOHNSON MARK G

1 patent