Inventor
MIYOSHI HIDENORI
JP25 patents
⚠️ This page may combine multiple inventors who share the name “MIYOSHI HIDENORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
11 patentsUS8999102B2Apr 7, 2015
Substrate processing apparatus
TOKYO ELECTRON LTD463 citations98
US8354337B2Jan 15, 2013
Metal oxide film formation method and apparatus
TOKYO ELECTRON LTD8 citations84
US11024514B2Jun 1, 2021
Etching method and etching apparatus
TOKYO ELECTRON LTD0 citations62
US8003535B2Aug 23, 2011
Semiconductor device manufacturing method and target substrate processing system
TOKYO ELECTRON LTD2 citations62
US7709394B2May 4, 2010
Substrate processing method and apparatus fabrication process of a semiconductor device
TOKYO ELECTRON LTD2 citations62
US7556711B2Jul 7, 2009
Semiconductor device manufacturing apparatus and operating method thereof
TOKYO ELECTRON LTD2 citations62
US7279434B2Oct 9, 2007
Material and method for forming low-dielectric-constant film
TOKYO ELECTRON LTD4 citations62
US8029856B2Oct 4, 2011
Film formation method and apparatus
TOKYO ELECTRON LTD4 citations61
US7772130B2Aug 10, 2010
Insulation film forming method, insulation film forming system, and semiconductor device manufacturing method
TOKYO ELECTRON LTD4 citations54
US12266562B2Apr 1, 2025
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations48
US10825688B2Nov 3, 2020
Method for etching copper layer
TOKYO ELECTRON LTD0 citations39
MIYOSHI HIDENORI
7 patentsUS8785311B2Jul 22, 2014
Film forming method, semiconductor device, manufacturing method thereof and substrate processing apparatus therefor
MIYOSHI HIDENORI464 citations98
US8765221B2Jul 1, 2014
Film forming method and film forming apparatus
MIYOSHI HIDENORI5 citations72
US8653665B2Feb 18, 2014
Barrier layer, film forming method, and processing system
MIYOSHI HIDENORI6 citations72
US8114786B2Feb 14, 2012
Heat treatment method, heat treatment apparatus and substrate processing apparatus
MIYOSHI HIDENORI2 citations62
US8310054B2Nov 13, 2012
Semiconductor device manufacturing method and target substrate processing system
MIYOSHI HIDENORI0 citations51
US8138095B2Mar 20, 2012
Method of substrate treatment, process for producing semiconductor device, substrate treating apparatus, and recording medium
MIYOSHI HIDENORI0 citations51
US9293417B2Mar 22, 2016
Method for forming barrier film on wiring line
MIYOSHI HIDENORI0 citations41