Inventor

COX MICHAEL S

US61 patents

⚠️ This page may combine multiple inventors who share the name “COX MICHAEL S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

COX MICHAEL S

APPLIED MATERIALS INC

Sequential gas flow oxide deposition technique

Multi-core transformer plasma source

Toroidal plasma source for plasma processing

Deposition process for high aspect ratio trenches

Gapfill process using a combination of spin-on-glass deposition and chemical vapor deposition techniques

Multi-core transformer plasma source

Non-intrusive plasma probe

Atmospheric substrate processing apparatus for depositing multiple layers on a substrate

Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system

Apparatus for treating an exhaust gas in a foreline

Sputtering target with backside cooling grooves

Locally heated multi-zone substrate support

In-situ removable electrostatic chuck

Locally heated multi-zone substrate support

Abatement system having a plasma source

Hall effect enhanced capacitively coupled plasma source

Plasma abatement of compounds containing heavy atoms

Toroidal plasma source for plasma processing

Method and apparatus for gas abatement

Gapfill process using a combination of spin-on-glass deposition and chemical vapor deposition techniques

Sputtering target with backside cooling grooves

High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process

Sputtering target with backside cooling grooves

Locally heated multi-zone substrate support

Gas cooled substrate support for stabilized high temperature deposition

In-situ removable electrostatic chuck

Encapsulated magnetron

Electrostatic chuck for high temperature process applications

Electrostatic carrier for thin substrate handling

Capacitively coupled plasma source for abating compounds produced in semiconductor processes

Plasma abatement of compounds containing heavy atoms

Plasma abatement of compounds containing heavy atoms

Smart chamber and smart chamber components

Multistep cure technique for spin-on-glass films

Chamber clean method using remote and in situ plasma cleaning systems

Gas cooled substrate support for stabilized high temperature deposition

Sputtering target with backside cooling grooves

Use of germanium dioxide and/or alloys of GeO2 with silicon dioxide for semiconductor dielectric applications

HDP-CVD uniformity control

Arcing detection apparatus for plasma processing

Smart chamber and smart chamber components

Method and apparatus for gas abatement

Ground shield with reentrant feature

LONG AIRDOX CO

Adjustable yoke assembly

Adjustable yoke assembly

Adjustable yoke assembly

BALSEANU MIHAELA

Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure

Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure

RITCHIE ALAN

Deposition apparatus and methods to reduce deposition asymmetry

COX MICHAEL S

Conveyor sprocket assembly