Inventor
SAKAMOTO HIROMU
JP23 patents
⚠️ This page may combine multiple inventors who share the name “SAKAMOTO HIROMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ICHIKAWA KOJI
11 patentsUS8906589B2Dec 9, 2014
Salt and photoresist composition comprising the same
ICHIKAWA KOJI5 citations73
US8993210B2Mar 31, 2015
Salt and photoresist composition containing the same
ICHIKAWA KOJI3 citations62
US8835095B2Sep 16, 2014
Resist composition and method for producing resist pattern
ICHIKAWA KOJI2 citations62
US8663899B2Mar 4, 2014
Resist composition and method for producing resist pattern
ICHIKAWA KOJI3 citations62
US8753796B2Jun 17, 2014
Photoresist composition
ICHIKAWA KOJI1 citations51
US8753795B2Jun 17, 2014
Photoresist composition
ICHIKAWA KOJI1 citations51
US8557500B2Oct 15, 2013
Salt and photoresist composition comprising the same
ICHIKAWA KOJI1 citations51
US8318404B2Nov 27, 2012
Salt and photoresist composition containing the same
ICHIKAWA KOJI0 citations51
US9726976B2Aug 8, 2017
Photoresist composition
ICHIKAWA KOJI0 citations41
US9429841B2Aug 30, 2016
Resist composition and method for producing resist pattern
ICHIKAWA KOJI0 citations41
US8778594B2Jul 15, 2014
Resist composition and method for producing resist pattern
ICHIKAWA KOJI0 citations41
SUMITOMO CHEMICAL CO
9 patentsUS7612217B2Nov 3, 2009
Sulfonium compound
SUMITOMO CHEMICAL CO27 citations92
US8367298B2Feb 5, 2013
Salt and photoresist composition containing the same
SUMITOMO CHEMICAL CO11 citations83
US11119408B2Sep 14, 2021
Compound, resin and photoresist composition
SUMITOMO CHEMICAL CO0 citations52
US9580402B2Feb 28, 2017
Salt, acid generator, photoresist composition, and method for producing photoresist pattern
SUMITOMO CHEMICAL CO1 citations52
US11561471B2Jan 24, 2023
Photoresist composition
SUMITOMO CHEMICAL CO0 citations51
US9809669B2Nov 7, 2017
Salt, resin, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations41
US9233945B2Jan 12, 2016
Compound, resin and photoresist composition
SUMITOMO CHEMICAL CO0 citations41
US7625689B2Dec 1, 2009
Chemically amplified positive resist composition
SUMITOMO CHEMICAL CO0 citations41
US10838300B2Nov 17, 2020
Salt and photoresist composition containing the same
SUMITOMO CHEMICAL CO0 citations40