Inventor
LIM HA-JIN
KR35 patents
⚠️ This page may combine multiple inventors who share the name “LIM HA-JIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
24 patentsUS7482677B2Jan 27, 2009
Dielectric structures having high dielectric constants, and non-volatile semiconductor memory devices having the dielectric structures
SAMSUNG ELECTRONICS CO LTD88 citations98
US7651729B2Jan 26, 2010
Method of fabricating metal silicate layer using atomic layer deposition technique
SAMSUNG ELECTRONICS CO LTD61 citations97
US7547951B2Jun 16, 2009
Semiconductor devices having nitrogen-incorporated active region and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD36 citations92
US9859392B2Jan 2, 2018
Integrated circuit device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD9 citations84
US7973309B2Jul 5, 2011
TEG pattern for detecting void in device isolation layer and method of forming the same
SAMSUNG ELECTRONICS CO LTD8 citations84
US7952118B2May 31, 2011
Semiconductor device having different metal gate structures
SAMSUNG ELECTRONICS CO LTD14 citations84
US7829953B2Nov 9, 2010
Semiconductor device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD13 citations84
US7396777B2Jul 8, 2008
Method of fabricating high-k dielectric layer having reduced impurity
SAMSUNG ELECTRONICS CO LTD10 citations84
US7615830B2Nov 10, 2009
Transistors with multilayered dielectric films
SAMSUNG ELECTRONICS CO LTD5 citations74
US11183525B2Nov 23, 2021
Image sensor including laser shield pattern
SAMSUNG ELECTRONICS CO LTD2 citations73
US9728463B2Aug 8, 2017
Methods of manufacturing semiconductor devices
SAMSUNG ELECTRONICS CO LTD2 citations70
US11152415B2Oct 19, 2021
Image sensor with separation pattern and image sensor module including the same
SAMSUNG ELECTRONICS CO LTD4 citations69
US8013402B2Sep 6, 2011
Transistors with multilayered dielectric films
SAMSUNG ELECTRONICS CO LTD3 citations63
US11257857B2Feb 22, 2022
Image sensors including photoelectric conversion devices, trench, supporter, and isolation layer
SAMSUNG ELECTRONICS CO LTD1 citations61
US8963227B2Feb 24, 2015
Semiconductor devices having a diffusion barrier layer and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD2 citations61
US10312341B2Jun 4, 2019
Integrated circuit device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations52
US8975171B1Mar 10, 2015
Method of forming a high-k crystalline dielectric
SAMSUNG ELECTRONICS CO LTD0 citations52
US8970014B2Mar 3, 2015
Semiconductor devices with dielectric layers
SAMSUNG ELECTRONICS CO LTD0 citations52
US7648874B2Jan 19, 2010
Method of forming a dielectric structure having a high dielectric constant and method of manufacturing a semiconductor device having the dielectric structure
SAMSUNG ELECTRONICS CO LTD0 citations52
US10276694B2Apr 30, 2019
Semiconductor device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD0 citations51
US9515186B2Dec 6, 2016
Semiconductor device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD0 citations51
US9023718B2May 5, 2015
Method of fabricating semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations51
US10854677B2Dec 1, 2020
Image sensor
SAMSUNG ELECTRONICS CO LTD0 citations50
US7767512B2Aug 3, 2010
Methods of manufacturing a semiconductor device including CMOS transistor having different PMOS and NMOS gate electrode structures
SAMSUNG ELECTRONICS CO LTD0 citations41
LIM HA-JIN
8 patentsUS8476155B1Jul 2, 2013
Formation of a high-K crystalline dielectric composition
LIM HA-JIN12 citations83
US8502286B2Aug 6, 2013
Etch stop layers and methods of forming the same
LIM HA-JIN6 citations72
US8563411B2Oct 22, 2013
Semiconductor devices having a diffusion barrier layer and methods of manufacturing the same
LIM HA-JIN4 citations60
US8557713B2Oct 15, 2013
Semiconductor devices and method of forming the same
LIM HA-JIN0 citations51
US8252674B2Aug 28, 2012
Transistors with multilayered dielectric films and methods of manufacturing such transistors
LIM HA-JIN0 citations51
US8227308B2Jul 24, 2012
Method of fabricating semiconductor integrated circuit device
LIM HA-JIN1 citations51
US8455345B2Jun 4, 2013
Methods of forming gate structure and methods of manufacturing semiconductor device including the same
LIM HA-JIN0 citations50
US8664111B2Mar 4, 2014
Method of patterning a semiconductor device with hard mask
LIM HA-JIN0 citations39