P

Inventor

CHEN GRACE HSIU-LING

US22 patents
⚠️ This page may combine multiple inventors who share the name “CHEN GRACE HSIU-LING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KLA TENCOR CORP

17 patents
US10043261B2Aug 7, 2018

Generating simulated output for a specimen

KLA TENCOR CORP32 citations94
US9092846B2Jul 28, 2015

Detecting defects on a wafer using defect-specific and multi-channel information

KLA TENCOR CORP30 citations94
US9916965B2Mar 13, 2018

Hybrid inspectors

KLA TENCOR CORP13 citations84
US9846930B2Dec 19, 2017

Detecting defects on a wafer using defect-specific and multi-channel information

KLA TENCOR CORP5 citations84
US10416087B2Sep 17, 2019

Systems and methods for defect detection using image reconstruction

KLA TENCOR CORP11 citations82
US10643819B2May 5, 2020

Method and system for charged particle microscopy with improved image beam stabilization and interrogation

KLA TENCOR CORP6 citations81
US9552636B2Jan 24, 2017

Detecting defects on a wafer using defect-specific and multi-channel information

KLA TENCOR CORP3 citations73
US10648924B2May 12, 2020

Generating high resolution images from low resolution images for semiconductor applications

KLA TENCOR CORP5 citations72
US9645093B2May 9, 2017

System and method for apodization in a semiconductor device inspection system

KLA TENCOR CORP3 citations69
US9239295B2Jan 19, 2016

Variable polarization wafer inspection

KLA TENCOR CORP4 citations69
US9176069B2Nov 3, 2015

System and method for apodization in a semiconductor device inspection system

KLA TENCOR CORP5 citations69
US10429319B2Oct 1, 2019

Inspection system including parallel imaging paths with multiple and selectable spectral bands

KLA TENCOR CORP1 citations61
US9128064B2Sep 8, 2015

Super resolution inspection system

KLA TENCOR CORP2 citations61
US11120969B2Sep 14, 2021

Method and system for charged particle microscopy with improved image beam stabilization and interrogation

KLA TENCOR CORP0 citations59
US9442077B2Sep 13, 2016

Scratch filter for wafer inspection

KLA TENCOR CORP1 citations51
US11302511B2Apr 12, 2022

Field curvature correction for multi-beam inspection systems

KLA TENCOR CORP0 citations50
US11410830B1Aug 9, 2022

Defect inspection and review using transmissive current image of charged particle beam system

KLA TENCOR CORP0 citations47

KLA CORP

3 patents

KLA TENCOR TECH CORP

2 patents