Inventor
CHEN GRACE HSIU-LING
US22 patents
⚠️ This page may combine multiple inventors who share the name “CHEN GRACE HSIU-LING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
17 patentsUS10043261B2Aug 7, 2018
Generating simulated output for a specimen
KLA TENCOR CORP32 citations94
US9092846B2Jul 28, 2015
Detecting defects on a wafer using defect-specific and multi-channel information
KLA TENCOR CORP30 citations94
US9916965B2Mar 13, 2018
Hybrid inspectors
KLA TENCOR CORP13 citations84
US9846930B2Dec 19, 2017
Detecting defects on a wafer using defect-specific and multi-channel information
KLA TENCOR CORP5 citations84
US10416087B2Sep 17, 2019
Systems and methods for defect detection using image reconstruction
KLA TENCOR CORP11 citations82
US10643819B2May 5, 2020
Method and system for charged particle microscopy with improved image beam stabilization and interrogation
KLA TENCOR CORP6 citations81
US9552636B2Jan 24, 2017
Detecting defects on a wafer using defect-specific and multi-channel information
KLA TENCOR CORP3 citations73
US10648924B2May 12, 2020
Generating high resolution images from low resolution images for semiconductor applications
KLA TENCOR CORP5 citations72
US9645093B2May 9, 2017
System and method for apodization in a semiconductor device inspection system
KLA TENCOR CORP3 citations69
US9239295B2Jan 19, 2016
Variable polarization wafer inspection
KLA TENCOR CORP4 citations69
US9176069B2Nov 3, 2015
System and method for apodization in a semiconductor device inspection system
KLA TENCOR CORP5 citations69
US10429319B2Oct 1, 2019
Inspection system including parallel imaging paths with multiple and selectable spectral bands
KLA TENCOR CORP1 citations61
US9128064B2Sep 8, 2015
Super resolution inspection system
KLA TENCOR CORP2 citations61
US11120969B2Sep 14, 2021
Method and system for charged particle microscopy with improved image beam stabilization and interrogation
KLA TENCOR CORP0 citations59
US9442077B2Sep 13, 2016
Scratch filter for wafer inspection
KLA TENCOR CORP1 citations51
US11302511B2Apr 12, 2022
Field curvature correction for multi-beam inspection systems
KLA TENCOR CORP0 citations50
US11410830B1Aug 9, 2022
Defect inspection and review using transmissive current image of charged particle beam system
KLA TENCOR CORP0 citations47
KLA CORP
3 patentsUS12203857B2Jan 21, 2025
Multi-element super resolution optical inspection system
KLA CORP0 citations51
US12524867B2Jan 13, 2026
System and method for optical wafer characterization with image up-sampling
KLA CORP0 citations45
US12298254B2May 13, 2025
System and method for reducing sample noise using selective markers
KLA CORP0 citations44