Inventor
KOFUJI NAOYUKI
JP30 patents
⚠️ This page may combine multiple inventors who share the name “KOFUJI NAOYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
11 patentsUS6677244B2Jan 13, 2004
Specimen surface processing method
HITACHI LTD18 citations92
US6573190B1Jun 3, 2003
Dry etching device and dry etching method
HITACHI LTD19 citations92
US6332425B1Dec 25, 2001
Surface treatment method and system
HITACHI LTD16 citations92
US6231777B1May 15, 2001
Surface treatment method and system
HITACHI LTD34 citations92
US6784109B2Aug 31, 2004
Method for fabricating semiconductor devices including wiring forming with a porous low-k film and copper
HITACHI LTD9 citations74
US11152237B2Oct 19, 2021
Substitute sample, method for determining control parameter of processing, and measurement system
HITACHI LTD2 citations72
US7604709B2Oct 20, 2009
Plasma processing apparatus
HITACHI LTD3 citations63
US6492277B1Dec 10, 2002
Specimen surface processing method and apparatus
HITACHI LTD4 citations63
US11287782B2Mar 29, 2022
Computer, method for determining processing control parameter, substitute sample, measurement system, and measurement method
HITACHI LTD1 citations62
US6797112B2Sep 28, 2004
Plasma treatment apparatus and method of producing semiconductor device using the apparatus
HITACHI LTD2 citations62
US7049243B2May 23, 2006
Surface processing method of a specimen and surface processing apparatus of the specimen
HITACHI LTD0 citations52
HITACHI HIGH TECH CORP
11 patentsUS7396771B2Jul 8, 2008
Plasma etching apparatus and plasma etching method
HITACHI HIGH TECH CORP15 citations84
US9099349B2Aug 4, 2015
Semiconductor device manufacturing method
HITACHI HIGH TECH CORP8 citations83
US11398371B2Jul 26, 2022
Plasma processing apparatus
HITACHI HIGH TECH CORP4 citations73
US10418224B2Sep 17, 2019
Plasma etching method
HITACHI HIGH TECH CORP3 citations71
US9960014B2May 1, 2018
Plasma etching method
HITACHI HIGH TECH CORP4 citations71
US9997337B2Jun 12, 2018
Plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP1 citations63
US9076637B2Jul 7, 2015
Plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP3 citations63
US11915951B2Feb 27, 2024
Plasma processing method
HITACHI HIGH TECH CORP1 citations62
US7680563B2Mar 16, 2010
Pressure control device for low pressure processing chamber
HITACHI HIGH TECH CORP3 citations62
US10418254B2Sep 17, 2019
Etching method and etching apparatus
HITACHI HIGH TECH CORP0 citations52
US11189470B2Nov 30, 2021
Search device, search method and plasma processing apparatus
HITACHI HIGH TECH CORP0 citations51