Inventor
PARK ALLEN
US36 patents
⚠️ This page may combine multiple inventors who share the name “PARK ALLEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
22 patentsUS10181185B2Jan 15, 2019
Image based specimen process control
KLA TENCOR CORP21 citations93
US9170209B1Oct 27, 2015
Inspection guided overlay metrology
KLA TENCOR CORP11 citations84
US10818001B2Oct 27, 2020
Using stochastic failure metrics in semiconductor manufacturing
KLA TENCOR CORP13 citations82
US8948495B2Feb 3, 2015
Inspecting a wafer and/or predicting one or more characteristics of a device being formed on a wafer
KLA TENCOR CORP8 citations81
US10943838B2Mar 9, 2021
Measurement of overlay error using device inspection system
KLA TENCOR CORP6 citations80
US7975245B2Jul 5, 2011
Computer-implemented methods for determining if actual defects are potentially systematic defects or potentially random defects
KLA TENCOR CORP13 citations79
US9536299B2Jan 3, 2017
Pattern failure discovery by leveraging nominal characteristics of alternating failure modes
KLA TENCOR CORP4 citations73
US10483081B2Nov 19, 2019
Self directed metrology and pattern classification
KLA TENCOR CORP4 citations72
US10359371B2Jul 23, 2019
Determining one or more characteristics of a pattern of interest on a specimen
KLA TENCOR CORP4 citations72
US9576861B2Feb 21, 2017
Method and system for universal target based inspection and metrology
KLA TENCOR CORP2 citations72
US10062012B1Aug 28, 2018
Finding patterns in a design based on the patterns and their surroundings
KLA TENCOR CORP4 citations71
US10740888B2Aug 11, 2020
Computer assisted weak pattern detection and quantification system
KLA TENCOR CORP2 citations70
US10262408B2Apr 16, 2019
System, method and computer program product for systematic and stochastic characterization of pattern defects identified from a semiconductor wafer
KLA TENCOR CORP4 citations69
US8826200B2Sep 2, 2014
Alteration for wafer inspection
KLA TENCOR CORP2 citations63
US10262831B2Apr 16, 2019
Method and system for weak pattern quantification
KLA TENCOR CORP1 citations62
US11295438B2Apr 5, 2022
Method and system for mixed mode wafer inspection
KLA TENCOR CORP0 citations61
US9518932B2Dec 13, 2016
Metrology optimized inspection
KLA TENCOR CORP2 citations61
US11784097B2Oct 10, 2023
Measurement of overlay error using device inspection system
KLA TENCOR CORP0 citations58
US10223492B1Mar 5, 2019
Based device risk assessment
KLA TENCOR CORP1 citations57
US10796065B2Oct 6, 2020
Hybrid design layout to identify optical proximity correction-related systematic defects
KLA TENCOR CORP0 citations52
US9940705B2Apr 10, 2018
System, method and computer program product for detecting defects in a fabricated target component using consistent modulation for the target and reference components
KLA TENCOR CORP0 citations52
US10192303B2Jan 29, 2019
Method and system for mixed mode wafer inspection
KLA TENCOR CORP0 citations51
PARK ALLEN
4 patentsUS8194968B2Jun 5, 2012
Methods and systems for using electrical information for a device being fabricated on a wafer to perform one or more defect-related functions
PARK ALLEN33 citations91
US8594823B2Nov 26, 2013
Scanner performance comparison and matching using design and defect data
PARK ALLEN9 citations78
US8656323B2Feb 18, 2014
Based device risk assessment
PARK ALLEN4 citations67
US10030959B2Jul 24, 2018
Blasting systems and methods
PARK ALLEN1 citations51