P

Inventor

PARK ALLEN

US36 patents
⚠️ This page may combine multiple inventors who share the name “PARK ALLEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KLA TENCOR CORP

22 patents
US10181185B2Jan 15, 2019

Image based specimen process control

KLA TENCOR CORP21 citations93
US9170209B1Oct 27, 2015

Inspection guided overlay metrology

KLA TENCOR CORP11 citations84
US10818001B2Oct 27, 2020

Using stochastic failure metrics in semiconductor manufacturing

KLA TENCOR CORP13 citations82
US8948495B2Feb 3, 2015

Inspecting a wafer and/or predicting one or more characteristics of a device being formed on a wafer

KLA TENCOR CORP8 citations81
US10943838B2Mar 9, 2021

Measurement of overlay error using device inspection system

KLA TENCOR CORP6 citations80
US7975245B2Jul 5, 2011

Computer-implemented methods for determining if actual defects are potentially systematic defects or potentially random defects

KLA TENCOR CORP13 citations79
US9536299B2Jan 3, 2017

Pattern failure discovery by leveraging nominal characteristics of alternating failure modes

KLA TENCOR CORP4 citations73
US10483081B2Nov 19, 2019

Self directed metrology and pattern classification

KLA TENCOR CORP4 citations72
US10359371B2Jul 23, 2019

Determining one or more characteristics of a pattern of interest on a specimen

KLA TENCOR CORP4 citations72
US9576861B2Feb 21, 2017

Method and system for universal target based inspection and metrology

KLA TENCOR CORP2 citations72
US10062012B1Aug 28, 2018

Finding patterns in a design based on the patterns and their surroundings

KLA TENCOR CORP4 citations71
US10740888B2Aug 11, 2020

Computer assisted weak pattern detection and quantification system

KLA TENCOR CORP2 citations70
US10262408B2Apr 16, 2019

System, method and computer program product for systematic and stochastic characterization of pattern defects identified from a semiconductor wafer

KLA TENCOR CORP4 citations69
US8826200B2Sep 2, 2014

Alteration for wafer inspection

KLA TENCOR CORP2 citations63
US10262831B2Apr 16, 2019

Method and system for weak pattern quantification

KLA TENCOR CORP1 citations62
US11295438B2Apr 5, 2022

Method and system for mixed mode wafer inspection

KLA TENCOR CORP0 citations61
US9518932B2Dec 13, 2016

Metrology optimized inspection

KLA TENCOR CORP2 citations61
US11784097B2Oct 10, 2023

Measurement of overlay error using device inspection system

KLA TENCOR CORP0 citations58
US10223492B1Mar 5, 2019

Based device risk assessment

KLA TENCOR CORP1 citations57
US10796065B2Oct 6, 2020

Hybrid design layout to identify optical proximity correction-related systematic defects

KLA TENCOR CORP0 citations52
US9940705B2Apr 10, 2018

System, method and computer program product for detecting defects in a fabricated target component using consistent modulation for the target and reference components

KLA TENCOR CORP0 citations52
US10192303B2Jan 29, 2019

Method and system for mixed mode wafer inspection

KLA TENCOR CORP0 citations51

PARK ALLEN

4 patents

KLA TENCOR TECH CORP

2 patents

CHANG ELLIS

2 patents

KLA-TENCOR TECH CORP

1 patent

ZAFAR KHURRAM

1 patent

KLA CORP

1 patent

PWS SYSTEMS PTY LTD

1 patent

GAO LISHENG

1 patent

PWS—Stemsafe JV Pty Ltd

1 patent