Inventor

SATAKE MASAKI

JP33 patents

⚠️ This page may combine multiple inventors who share the name “SATAKE MASAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SATAKE MASAKI

FUJI PHOTO FILM CO LTD

Magnetic recording medium having a magnetic layer containing ferromagnetic powder and a polyurethane resin obtained from a polyolefin polyol or a polybutadiene polyol

Magnetic recording medium

Magnetic recording medium

Magnetic recording medium

Magnetic recording medium comprising ferromagnetic powder and a specified polyurethane resin

Magnetic recording medium having a carbon protective layer and a fluoro-lubricant supplied from a backcoat layer

Magnetic recording medium

Method for developing of silver halide photographic materials utilizing reduced amounts of organic substances

Silver halide photographic material

Photographic element for color diffusion transfer with two neutralizing layers

Magnetic recording medium

Magnetic recording medium having a lower layer containing a specified polyurethane binder

Magnetic recording medium having a cobalt thin film magnetic layer, carbon protective layer, and fluorolubricant layer

Magnetic recording medium comprising a magnetic metallic thin film and a layer containing a specified fluorine compound and a specified tetrazaindene cyclic compound or thiouracil cyclic compound

Magnetic recording medium having a protective layer containing a tetrazaindene or thiouracil cyclic compound and a fluorine compound

Magnetic recording medium having a polyvinyl alkyl binder resin

Silver halide photographic material

Silver halide photographic material

Silver halide photographic material comprising a protective layer containing a polyoxyethylene surface active agent

Magnetic recording medium having a magnetic layer comprising ferromagnetic particles, polyurethane resin and polyvinylacetal resin

Color diffusion transfer element comprising two neutralizing layers and two timing layers

TOSHIBA KK

Creating method of simulation model, manufacturing method of photo mask, manufacturing method of semiconductor device, and recording medium

Pattern prediction method, pattern correction method, semiconductor device, and recording medium

Lithography simulation method, method of manufacturing a semiconductor device and program

Lithography simulation method, photomask manufacturing method, semiconductor device manufacturing method, and recording medium

Lithography simulation method, program and semiconductor device manufacturing method

DINO TECH ACQUISITION LLC

Technique for repairing a reflective photo-mask

Technique for repairing an EUV photo-mask

Film-growth model using level sets

FUKUHARA KAZUYA

Mask pattern correcting method

DINO TECHNOLOGY ACQUISITION LLC

Technique for repairing a reflective photo-mask

KLA CORP

Dispositioning defects detected on extreme ultraviolet photomasks

KITAMURA YOSUKE

Projection exposure method