P

Inventor

HIMORI SHINJI

JP56 patents
⚠️ This page may combine multiple inventors who share the name “HIMORI SHINJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

30 patents
US5888907AMar 30, 1999

Plasma processing method

TOKYO ELECTRON LTD427 citations99
US8703002B2Apr 22, 2014

Plasma processing apparatus, plasma processing method and storage medium

TOKYO ELECTRON LTD343 citations98
US10553407B2Feb 4, 2020

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD47 citations97
US6733624B2May 11, 2004

Apparatus for holding an object to be processed

TOKYO ELECTRON LTD66 citations96
US9564287B2Feb 7, 2017

Substrate processing apparatus and substrate processing method using same

TOKYO ELECTRON LTD41 citations94
US7104217B2Sep 12, 2006

Plasma processing apparatus

TOKYO ELECTRON LTD67 citations94
US7619870B2Nov 17, 2009

Electrostatic chuck

TOKYO ELECTRON LTD24 citations92
US7622017B2Nov 24, 2009

Processing apparatus and gas discharge suppressing member

TOKYO ELECTRON LTD8 citations83
US7230202B2Jun 12, 2007

Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod

TOKYO ELECTRON LTD9 citations74
US11387077B2Jul 12, 2022

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD3 citations73
US11170979B2Nov 9, 2021

Plasma etching method and plasma etching apparatus

TOKYO ELECTRON LTD4 citations73
US7850174B2Dec 14, 2010

Plasma processing apparatus and focus ring

TOKYO ELECTRON LTD7 citations73
US10651012B2May 12, 2020

Substrate processing method

TOKYO ELECTRON LTD3 citations72
US9390943B2Jul 12, 2016

Substrate processing apparatus

TOKYO ELECTRON LTD4 citations72
US9978566B2May 22, 2018

Plasma etching method

TOKYO ELECTRON LTD2 citations71
US12033832B2Jul 9, 2024

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations63
US9412562B2Aug 9, 2016

Capacitive coupling plasma processing apparatus

TOKYO ELECTRON LTD2 citations63
US12537172B2Jan 27, 2026

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations62
US12437970B2Oct 7, 2025

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations62
US11764034B2Sep 19, 2023

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations62
US11450515B2Sep 20, 2022

Plasma processing apparatus

TOKYO ELECTRON LTD0 citations62
US10699935B2Jun 30, 2020

Semiconductor manufacturing device and processing method

TOKYO ELECTRON LTD1 citations62
US12424424B2Sep 23, 2025

Plasma monitoring system, plasma monitoring method, and monitoring device

TOKYO ELECTRON LTD0 citations61
US11133157B2Sep 28, 2021

Plasma processing apparatus

TOKYO ELECTRON LTD1 citations61
US7767055B2Aug 3, 2010

Capacitive coupling plasma processing apparatus

TOKYO ELECTRON LTD5 citations59
US12537168B2Jan 27, 2026

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations52
US12255049B2Mar 18, 2025

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD0 citations52
US10825663B2Nov 3, 2020

Plasma processing apparatus

TOKYO ELECTRON LTD0 citations52
US10032611B2Jul 24, 2018

Connection control method

TOKYO ELECTRON LTD1 citations52
US8651049B2Feb 18, 2014

Plasma processing apparatus

TOKYO ELECTRON LTD1 citations52

HIMORI SHINJI

8 patents
US8070911B2Dec 6, 2011

Capacitive coupling plasma processing apparatus

HIMORI SHINJI16 citations92
US9245776B2Jan 26, 2016

Plasma processing apparatus

HIMORI SHINJI9 citations84
US9275836B2Mar 1, 2016

Plasma processing apparatus and plasma processing method

HIMORI SHINJI3 citations73
US8512511B2Aug 20, 2013

Mounting table and plasma processing apparatus

HIMORI SHINJI5 citations73
US9859146B2Jan 2, 2018

Semiconductor manufacturing device and processing method

HIMORI SHINJI3 citations72
US9202675B2Dec 1, 2015

Plasma processing apparatus and electrode for same

HIMORI SHINJI2 citations63
US9038566B2May 26, 2015

Capacitive coupling plasma processing apparatus

HIMORI SHINJI2 citations62
US8284538B2Oct 9, 2012

Electrostatic chuck device

HIMORI SHINJI5 citations61

TOSHIBA KK

3 patents
US10388544B2Aug 20, 2019

Substrate processing apparatus and substrate processing method

TOSHIBA KK45 citations93
US5514425AMay 7, 1996

Method of forming a thin film

TOSHIBA KK34 citations91
US7186315B2Mar 6, 2007

Plasma treatment apparatus

TOSHIBA KK10 citations84

OCTEC INC

2 patents
US7585386B2Sep 8, 2009

Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method

OCTEC INC33 citations91
US7922862B2Apr 12, 2011

Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method

OCTEC INC9 citations83

KOSHIMIZU CHISHIO

2 patents
US8293068B2Oct 23, 2012

Plasma processing apparatus

KOSHIMIZU CHISHIO17 citations84
US8178444B2May 15, 2012

Substrate processing method and substrate processing apparatus

KOSHIMIZU CHISHIO3 citations63

UI AKIO

1 patent
US8821684B2Sep 2, 2014

Substrate plasma processing apparatus and plasma processing method

UI AKIO52 citations92

OHSE TAKESHI

1 patent
US8568606B2Oct 29, 2013

Substrate processing apparatus and substrate processing method using same

OHSE TAKESHI37 citations91

TOKYO HY POWER LABS INC

1 patent
US7112926B2Sep 26, 2006

Matching unit and plasma processing system

TOKYO HY POWER LABS INC22 citations88

KOSHIISHI AKIRA

1 patent
US8741098B2Jun 3, 2014

Table for use in plasma processing system and plasma processing system

KOSHIISHI AKIRA11 citations84

ENDOH SHOSUKE

1 patent
US8114247B2Feb 14, 2012

Plasma processing apparatus and focus ring

ENDOH SHOSUKE8 citations81

Showing the top 50 of 56 patents by PatentIndex Score.