Inventor
CHEN HUNG-HSU
TW32 patents
Patents
32 patentsUS11232947B1Jan 25, 2022
Ammonium fluoride pre-clean protection
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations85
US11348839B2May 31, 2022
Method of manufacturing semiconductor devices with multiple silicide regions
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10755917B2Aug 25, 2020
Treatment for adhesion improvement
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10535748B2Jan 14, 2020
Method of forming a contact with a silicide region
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations83
US11342225B2May 24, 2022
Barrier-free approach for forming contact plugs
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9870995B2Jan 16, 2018
Formation of copper layer structure with self anneal strain improvement
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11373905B2Jun 28, 2022
Semiconductor device pre-cleaning
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12532721B2Jan 20, 2026
Barrier-free approach for forming contact plugs
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12328890B2Jun 10, 2025
Contact with a silicide region
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12300900B2May 13, 2025
Ammonium fluoride pre-clean protection
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12300542B2May 13, 2025
Semiconductor device pre-cleaning
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12218012B2Feb 4, 2025
Method of manufacturing semiconductor devices with multiple silicide regions
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12166078B2Dec 10, 2024
Contact structure for semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12046510B2Jul 23, 2024
Conductive feature formation and structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12009200B2Jun 11, 2024
Treatment for adhesion improvement
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11915976B2Feb 27, 2024
Semiconductor device pre-cleaning
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11901229B2Feb 13, 2024
Barrier-free approach for forming contact plugs
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11810826B2Nov 7, 2023
Semiconductor devices with stacked silicide regions
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11594410B2Feb 28, 2023
Treatment for adhesion improvement
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11411094B2Aug 9, 2022
Contact with a silicide region
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11335774B2May 17, 2022
Contact structure for semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11177172B2Nov 16, 2021
Semiconductor structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11031286B2Jun 8, 2021
Conductive feature formation and structure
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12300496B2May 13, 2025
Deposition window enlargement
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11742210B2Aug 29, 2023
Deposition window enlargement
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12087642B2Sep 10, 2024
Selective dual silicide formation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US11676868B2Jun 13, 2023
Selective dual silicide formation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US12456617B2Oct 28, 2025
Semiconductor device pre-cleaning
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations57
US10840184B2Nov 17, 2020
Formation of copper layer structure with self anneal strain improvement
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10483164B2Nov 19, 2019
Semiconductor structure and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12438003B2Oct 7, 2025
Semiconductor structure and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12419077B2Sep 16, 2025
Method for forming dual silicide in manufacturing process of semiconductor structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51