Inventor
GUO XIN SHENG
US11 patents
Patents
11 patentsUS6050506AApr 18, 2000
Pattern of apertures in a showerhead for chemical vapor deposition
APPLIED MATERIALS INC708 citations98
US5885356AMar 23, 1999
Method of reducing residue accumulation in CVD chamber using ceramic lining
APPLIED MATERIALS INC154 citations98
US6251759B1Jun 26, 2001
Method and apparatus for depositing material upon a semiconductor wafer using a transition chamber of a multiple chamber semiconductor wafer processing system
APPLIED MATERIALS INC88 citations96
US5853607ADec 29, 1998
CVD processing chamber
APPLIED MATERIALS INC91 citations96
US6096135AAug 1, 2000
Method and apparatus for reducing contamination of a substrate in a substrate processing system
APPLIED MATERIALS INC64 citations95
US5403459AApr 4, 1995
Cleaning of a PVD chamber containing a collimator
APPLIED MATERIALS INC45 citations95
US6358323B1Mar 19, 2002
Method and apparatus for improved control of process and purge material in a substrate processing system
APPLIED MATERIALS INC73 citations94
US6296712B1Oct 2, 2001
Chemical vapor deposition hardware and process
APPLIED MATERIALS INC68 citations94
US6410089B1Jun 25, 2002
Chemical vapor deposition of copper using profiled distribution of showerhead apertures
APPLIED MATERIALS INC23 citations92
US6374512B1Apr 23, 2002
Method for reducing contamination of a substrate in a substrate processing system
APPLIED MATERIALS INC32 citations92
US5944899AAug 31, 1999
Inductively coupled plasma processing chamber
APPLIED MATERIALS INC27 citations92