Inventor

LAI WEI-HAN

TW55 patents

⚠️ This page may combine multiple inventors who share the name “LAI WEI-HAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LAI WEI-HAN

TAIWAN SEMICONDUCTOR MFG CO LTD

Extreme ultraviolet photoresist

Negative tone developer composition for extreme ultraviolet lithography

Photoresist and method

Method of manufacturing a semiconductor device

Extreme ultraviolet photoresist with high-efficiency electron transfer

Underlayer material for photoresist

Lithography process and material for negative tone development

Underlayer material for photoresist

Extreme ultraviolet photoresist with high-efficiency electron transfer

Method of semiconductor device fabrication having application of material with cross-linkable component

Material composition and process for substrate modification

Photoresist and method

Method of priming photoresist before application of a shrink material in a lithography process

Photoresist additive for outgassing reduction and out-of-band radiation absorption

Method of manufacturing a semiconductor device

Spin on carbon composition and method of manufacturing a semiconductor device

Spin on carbon composition and method of manufacturing a semiconductor device

Photoresist and method

Photoresist having decreased outgassing

Method of manufacturing a semiconductor device

Coating composition for photolithography

Lithography process and material for negative tone development

Extreme ultraviolet photoresist with high-efficiency electron transfer

Underlayer material for photoresist

Method of manufacturing a semiconductor device

Method of manufacturing a semiconductor device

Negative tone developer for extreme ultraviolet lithography

Photoresist and method

Extreme ultraviolet photoresist and method

Method of manufacturing a semiconductor device

Photoresist composition and method of forming photoresist pattern

Spin on carbon composition and method of manufacturing a semiconductor device

Underlayer of multilayer structure and methods of use thereof

Photoresist composition and method of forming photoresist pattern

Negative tone photoresist for EUV lithography

Photoresist and method of manufacturing a semiconductor device

Method of manufacturing a semiconductor device

Photoresist composition and method of manufacturing a semiconductor device

Photoresist composition and method of manufacturing a semiconductor device

Material composition and process for substrate modification

Negative tone developer for extreme ultraviolet lithography

Extreme ultraviolet photoresist and method

Extreme ultraviolet photoresist and method

Chemical treatment for lithography improvement in a negative tone development process

Photoresist composition and method of manufacturing semiconductor device

Photoresist and method

Method for forming semiconductor structure using modified resist layer

ACOUSTICSHEEP LLC

Functional headwear

ADVANCED SEMICONDUCTOR ENG

Bonding device and bonding method

TAIWAN SEMICONDUCTOR MFG

Photoresist system and method