Inventor
LIU YOWJUANG WILLIAM
US21 patents
Patents
21 patentsUS5889302AMar 30, 1999
Multilayer floating gate field effect transistor structure for use in integrated circuit devices
ADVANCED MICRO DEVICES INC174 citations99
US6225669B1May 1, 2001
Non-uniform gate/dielectric field effect transistor
ADVANCED MICRO DEVICES INC136 citations97
US6124608ASep 26, 2000
Non-volatile trench semiconductor device having a shallow drain region
ADVANCED MICRO DEVICES INC68 citations96
US5936280AAug 10, 1999
Multilayer quadruple gate field effect transistor structure for use in integrated circuit devices
ADVANCED MICRO DEVICES INC75 citations96
US6528847B2Mar 4, 2003
Metal oxide semiconductor device having contoured channel region and elevated source and drain regions
ADVANCED MICRO DEVICES INC23 citations92
US6027998AFeb 22, 2000
Method for fully planarized conductive line for a stack gate
ADVANCED MICRO DEVICES INC48 citations92
US6002151ADec 14, 1999
Non-volatile trench semiconductor device
ADVANCED MICRO DEVICES INC35 citations92
US6744101B2Jun 1, 2004
Non-uniform gate/dielectric field effect transistor
ADVANCED MICRO DEVICES INC38 citations91
US6147507ANov 14, 2000
System and method of mapping leakage current and a defect profile of a semiconductor dielectric layer
ADVANCED MICRO DEVICES INC20 citations91
US6023327AFeb 8, 2000
System and method for detecting defects in an interlayer dielectric of a semiconductor device
ADVANCED MICRO DEVICES INC23 citations91
US6031269AFeb 29, 2000
Quadruple gate field effect transistor structure for use in integrated circuit devices
ADVANCED MICRO DEVICES INC18 citations84
US6002160ADec 14, 1999
Semiconductor isolation process to minimize weak oxide problems
ADVANCED MICRO DEVICES INC16 citations82
US6309949B1Oct 30, 2001
Semiconductor isolation process to minimize weak oxide problems
ADVANCED MICRO DEVICES INC12 citations74
US6294829B1Sep 25, 2001
Multilayer quadruple gate field effect transistor structure for use in integrated circuit devices
ADVANCED MICRO DEVICES INC14 citations74
US6146973ANov 14, 2000
High density isolation using an implant as a polish stop
ADVANCED MICRO DEVICES INC15 citations74
US5950097ASep 7, 1999
Advanced isolation scheme for deep submicron technology
ADVANCED MICRO DEVICES INC13 citations74
US6177802B1Jan 23, 2001
System and method for detecting defects in an interlayer dielectric of a semiconductor device using the hall-effect
ADVANCED MICRO DEVICES INC9 citations72
US6051451AApr 18, 2000
Heavy ion implant process to eliminate polystringers in high density type flash memory devices
ADVANCED MICRO DEVICES INC5 citations63
US6407558B2Jun 18, 2002
Method of determining the doping concentration across a surface of a semiconductor material
ADVANCED MICRO DEVICES INC4 citations61
US6320403B1Nov 20, 2001
Method of determining the doping concentration and defect profile across a surface of a processed semiconductor material
ADVANCED MICRO DEVICES INC4 citations61
US6208154B1Mar 27, 2001
Method of determining the doping concentration across a surface of a semiconductor material
ADVANCED MICRO DEVICES INC3 citations61