Inventor
NAMBA KATSUHIKO
JP6 patents
Patents
6 patentsUS6645692B2Nov 11, 2003
Photoresist composition
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US5849457ADec 15, 1998
Positive-working quinonediazide sulfonic acid ester resist composition utilizing solvent system including 2-heptanone, ethyl lactate, and γ-
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US6953651B2Oct 11, 2005
Chemical amplifying type positive resist composition
SUMITOMO CHEMICAL CO5 citations62
US6762007B2Jul 13, 2004
Chemical amplification type positive resist composition
SUMITOMO CHEMICAL CO3 citations60
US6696218B2Feb 24, 2004
Chemical amplification type positive resist composition
SUMITOMO CHEMICAL CO3 citations58
US7144674B2Dec 5, 2006
Positive resist composition
SUMITOMO CHEMICAL CO1 citations49