Inventor
OKUMURA MASAHIDE
JP31 patents
⚠️ This page may combine multiple inventors who share the name “OKUMURA MASAHIDE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
26 patentsUS6159644ADec 12, 2000
Method of fabricating semiconductor circuit devices utilizing multiple exposures
HITACHI LTD100 citations98
US6121625ASep 19, 2000
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD30 citations96
US5650631AJul 22, 1997
Electron beam writing system
HITACHI LTD22 citations92
US4600839AJul 15, 1986
Small-dimension measurement system by scanning electron beam
HITACHI LTD35 citations92
US4841191AJun 20, 1989
Piezoelectric actuator control apparatus
HITACHI LTD46 citations90
US4099704AJul 11, 1978
Vacuum valve apparatus
HITACHI LTD32 citations89
US4039829AAug 2, 1977
Stereoscopic measuring apparatus
HITACHI LTD28 citations82
US4692579ASep 8, 1987
Electron beam lithography apparatus
HITACHI LTD21 citations81
US4090106AMay 16, 1978
Field emision electron gun with controlled power supply
HITACHI LTD24 citations81
US6441383B1Aug 27, 2002
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD6 citations74
US6320198B1Nov 20, 2001
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD4 citations74
US6262428B1Jul 17, 2001
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD6 citations74
US4670652AJun 2, 1987
Charged particle beam microprobe apparatus
HITACHI LTD19 citations74
US4099054AJul 4, 1978
Sem having d-c bias of video signal controlled by maximum and/or minimum of crt beam current
HITACHI LTD10 citations74
US4015191AMar 29, 1977
D.C. high voltage power source with precise load current measurement
HITACHI LTD8 citations74
US4829444AMay 9, 1989
Charged particle beam lithography system
HITACHI LTD9 citations73
US4701620AOct 20, 1987
Electron beam exposure apparatus
HITACHI LTD10 citations73
US5424550AJun 13, 1995
Charged particle beam exposure apparatus
HITACHI LTD14 citations72
US5281827AJan 25, 1994
Charged particle beam exposure apparatus
HITACHI LTD5 citations72
US4059783ANov 22, 1977
Field emission apparatus
HITACHI LTD7 citations72
US4808829AFeb 28, 1989
Mark position detection system for use in charged particle beam apparatus
HITACHI LTD8 citations71
US6555833B2Apr 29, 2003
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD1 citations63
US6403973B1Jun 11, 2002
Electron beam exposure method and apparatus and semiconductor device manufactured using the same
HITACHI LTD6 citations63
US6583431B2Jun 24, 2003
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD0 citations52
US6509572B2Jan 21, 2003
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD0 citations52
US6329665B1Dec 11, 2001
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD0 citations52