Inventor

SENTOKU KOICHI

JP53 patents

⚠️ This page may combine multiple inventors who share the name “SENTOKU KOICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SENTOKU KOICHI

CANON KK

Position detecting system and device manufacturing method using the same

X-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure method

Apparatus and method for detecting the relative positional deviation between two diffraction gratings

Measuring method and apparatus for meausring the positional relationship of first and second gratings

System and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction grating

Management system, apparatus, and method, exposure apparatus, and control method therefor

Position detecting method and apparatus, exposure apparatus and device manufacturing method

Management system and apparatus, method therefor, and device manufacturing method

Alignment method, alignment apparatus, profiler, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory

Position detecting method and position detecting device for detecting relative positions of objects having position detecting marks by using separate reference member having alignment marks

Position detecting system and device manufacturing method using the same

Exposure device and method for producing a mask for use in the device

Measuring method and apparatus for measuring system having measurement error changeable with time

Displacement measuring method and apparatus using plural light beam beat frequency signals

Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object

Apparatus for detecting positional deviation of diffraction gratings on a substrate by utilizing optical heterodyne interference of light beams incident on the gratings from first and second light emitters

Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes

Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means

Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected

Position detector for detecting the position of an object using a diffraction grating positioned at an angle

Measuring method and measuring apparatus

X-ray mask and X-ray exposure method using the same

Pattern transfer apparatus, imprint apparatus, and pattern transfer method

Method and program for calculating exposure dose and focus position in exposure apparatus, and device manufacturing method

Imprint apparatus and imprint method including dual movable image pick-up device

Alignment apparatus, exposure apparatus using the same, and method of manufacturing devices

Position detecting method and apparatus, exposure apparatus and device manufacturing method

Position detecting apparatus and a method for manufacturing semiconductor devices using the apparatus

Management system, apparatus, and method, exposure apparatus, and control method therefor

Position detection method and apparatus

Alignment apparatus, exposure apparatus using same, and method of manufacturing devices

Apparatus control system, apparatus control method, semiconductor exposure apparatus, semiconductor exposure apparatus control method and semiconductor device manufacturing method

Management system, management apparatus, management method, and device manufacturing method

Foreign substance inspecting method and apparatus, which detect a height of a foreign substance, and an exposure apparatus using this inspecting apparatus

Rotational deviation detecting method and system using a periodic pattern

Surface shape measurement apparatus and exposure apparatus

Management system and apparatus, method therefor, and device manufacturing method

Shape measuring apparatus, shape measuring method, and aligning method

Method for producing library

Position detection method and apparatus

Management system, management method and apparatus, and management apparatus control method

Shape measuring apparatus, shape measuring method, and aligning method

Method of manufacturing device, and substrate

Exposure apparatus

Lithography apparatus, lithography method, and method of manufacturing article

Imaging optical system and exposure apparatus

SENTOKU KOICHI

Lithography apparatus and device manufacturing method

Reticle manufacturing method, surface shape measuring apparatus and signal processor

SUEHIRA NOBUHITO

Alignment method, imprint method, alignment apparatus, and position measurement method

MATSUMOTO TAKAHIRO

Position detection apparatus, position detection method, exposure apparatus, and device fabrication method