P

Inventor

HUANG YONGZHANG

US18 patents
⚠️ This page may combine multiple inventors who share the name “HUANG YONGZHANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

AXCELIS TECH INC

17 patents
US6777696B1Aug 17, 2004

Deflecting acceleration/deceleration gap

AXCELIS TECH INC71 citations97
US6770888B1Aug 3, 2004

High mass resolution magnet for ribbon beam ion implanters

AXCELIS TECH INC51 citations96
US7476855B2Jan 13, 2009

Beam tuning with automatic magnet pole rotation for ion implanters

AXCELIS TECH INC43 citations92
US6881966B2Apr 19, 2005

Hybrid magnetic/electrostatic deflector for ion implantation systems

AXCELIS TECH INC35 citations92
US6835930B2Dec 28, 2004

High mass resolution magnet for ribbon beam ion implanters

AXCELIS TECH INC33 citations92
US6441382B1Aug 27, 2002

Deceleration electrode configuration for ultra-low energy ion implanter

AXCELIS TECH INC52 citations92
US7547899B2Jun 16, 2009

Charged beam dump and particle attractor

AXCELIS TECH INC12 citations84
US7915597B2Mar 29, 2011

Extraction electrode system for high current ion implanter

AXCELIS TECH INC19 citations83
US6774378B1Aug 10, 2004

Method of tuning electrostatic quadrupole electrodes of an ion beam implanter

AXCELIS TECH INC16 citations82
US7655930B2Feb 2, 2010

Ion source arc chamber seal

AXCELIS TECH INC8 citations80
US7507977B2Mar 24, 2009

System and method of ion beam control in response to a beam glitch

AXCELIS TECH INC10 citations80
US7566887B2Jul 28, 2009

Method of reducing particle contamination for ion implanters

AXCELIS TECH INC10 citations76
US7994488B2Aug 9, 2011

Low contamination, low energy beamline architecture for high current ion implantation

AXCELIS TECH INC5 citations62
US7488958B2Feb 10, 2009

High conductance ion source

AXCELIS TECH INC6 citations62
US7701230B2Apr 20, 2010

Method and system for ion beam profiling

AXCELIS TECH INC2 citations60
US7579604B2Aug 25, 2009

Beam stop and beam tuning methods

AXCELIS TECH INC0 citations52
US7557363B2Jul 7, 2009

Closed loop dose control for ion implantation

AXCELIS TECH INC0 citations50

HUANG YONGZHANG

1 patent