Inventor
HUANG YONGZHANG
US18 patents
⚠️ This page may combine multiple inventors who share the name “HUANG YONGZHANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AXCELIS TECH INC
17 patentsUS6777696B1Aug 17, 2004
Deflecting acceleration/deceleration gap
AXCELIS TECH INC71 citations97
US6770888B1Aug 3, 2004
High mass resolution magnet for ribbon beam ion implanters
AXCELIS TECH INC51 citations96
US7476855B2Jan 13, 2009
Beam tuning with automatic magnet pole rotation for ion implanters
AXCELIS TECH INC43 citations92
US6881966B2Apr 19, 2005
Hybrid magnetic/electrostatic deflector for ion implantation systems
AXCELIS TECH INC35 citations92
US6835930B2Dec 28, 2004
High mass resolution magnet for ribbon beam ion implanters
AXCELIS TECH INC33 citations92
US6441382B1Aug 27, 2002
Deceleration electrode configuration for ultra-low energy ion implanter
AXCELIS TECH INC52 citations92
US7547899B2Jun 16, 2009
Charged beam dump and particle attractor
AXCELIS TECH INC12 citations84
US7915597B2Mar 29, 2011
Extraction electrode system for high current ion implanter
AXCELIS TECH INC19 citations83
US6774378B1Aug 10, 2004
Method of tuning electrostatic quadrupole electrodes of an ion beam implanter
AXCELIS TECH INC16 citations82
US7655930B2Feb 2, 2010
Ion source arc chamber seal
AXCELIS TECH INC8 citations80
US7507977B2Mar 24, 2009
System and method of ion beam control in response to a beam glitch
AXCELIS TECH INC10 citations80
US7566887B2Jul 28, 2009
Method of reducing particle contamination for ion implanters
AXCELIS TECH INC10 citations76
US7994488B2Aug 9, 2011
Low contamination, low energy beamline architecture for high current ion implantation
AXCELIS TECH INC5 citations62
US7488958B2Feb 10, 2009
High conductance ion source
AXCELIS TECH INC6 citations62
US7701230B2Apr 20, 2010
Method and system for ion beam profiling
AXCELIS TECH INC2 citations60
US7579604B2Aug 25, 2009
Beam stop and beam tuning methods
AXCELIS TECH INC0 citations52
US7557363B2Jul 7, 2009
Closed loop dose control for ion implantation
AXCELIS TECH INC0 citations50