P

Inventor

JUNG SUG-WOO

KR27 patents
⚠️ This page may combine multiple inventors who share the name “JUNG SUG-WOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

19 patents
US7432185B2Oct 7, 2008

Method of forming semiconductor device having stacked transistors

SAMSUNG ELECTRONICS CO LTD183 citations99
US7381989B2Jun 3, 2008

Semiconductor device including upper and lower transistors and interconnection between upper and lower transistors

SAMSUNG ELECTRONICS CO LTD182 citations99
US7687331B2Mar 30, 2010

Stacked semiconductor device and method of fabrication

SAMSUNG ELECTRONICS CO LTD54 citations98
US7214620B2May 8, 2007

Methods of forming silicide films with metal films in semiconductor devices and contacts including the same

SAMSUNG ELECTRONICS CO LTD26 citations92
US7084061B2Aug 1, 2006

Methods of fabricating a semiconductor device having MOS transistor with strained channel

SAMSUNG ELECTRONICS CO LTD36 citations92
US10026890B2Jul 17, 2018

Magnetoresistive random access memory device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD6 citations84
US7833847B2Nov 16, 2010

Method of forming semiconductor device having stacked transistors

SAMSUNG ELECTRONICS CO LTD5 citations74
US7435634B2Oct 14, 2008

Methods of forming semiconductor devices having stacked transistors

SAMSUNG ELECTRONICS CO LTD8 citations74
US10062843B2Aug 28, 2018

Variable resistive memory device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD3 citations73
US7232756B2Jun 19, 2007

Nickel salicide process with reduced dopant deactivation

SAMSUNG ELECTRONICS CO LTD9 citations73
US7936024B2May 3, 2011

Semiconductor devices having stacked structures

SAMSUNG ELECTRONICS CO LTD3 citations63
US7238612B2Jul 3, 2007

Methods of forming a double metal salicide layer and methods of fabricating semiconductor devices incorporating the same

SAMSUNG ELECTRONICS CO LTD2 citations62
US10305037B2May 28, 2019

Variable resistive memory device

SAMSUNG ELECTRONICS CO LTD0 citations52
US10249816B2Apr 2, 2019

Magnetoresistive random access memory device

SAMSUNG ELECTRONICS CO LTD0 citations52
US7666786B2Feb 23, 2010

Methods of fabricating semiconductor devices having a double metal salicide layer

SAMSUNG ELECTRONICS CO LTD0 citations52
US7662707B2Feb 16, 2010

Method of forming relatively continuous silicide layers for semiconductor devices

SAMSUNG ELECTRONICS CO LTD0 citations52
US7579225B2Aug 25, 2009

Method of forming semiconductor device having stacked transistors

SAMSUNG ELECTRONICS CO LTD0 citations52
US7531459B2May 12, 2009

Methods of forming self-aligned silicide layers using multiple thermal processes

SAMSUNG ELECTRONICS CO LTD0 citations52
US7569483B2Aug 4, 2009

Methods of forming metal silicide layers by annealing metal layers using inert heat transferring gases established in a convection apparatus

SAMSUNG ELECTRONICS CO LTD0 citations41

SAMSUNG DISPLAY CO LTD

6 patents

OH GYU-HWAN

2 patents