Inventor
JUNG SUG-WOO
KR27 patents
⚠️ This page may combine multiple inventors who share the name “JUNG SUG-WOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
19 patentsUS7432185B2Oct 7, 2008
Method of forming semiconductor device having stacked transistors
SAMSUNG ELECTRONICS CO LTD183 citations99
US7381989B2Jun 3, 2008
Semiconductor device including upper and lower transistors and interconnection between upper and lower transistors
SAMSUNG ELECTRONICS CO LTD182 citations99
US7687331B2Mar 30, 2010
Stacked semiconductor device and method of fabrication
SAMSUNG ELECTRONICS CO LTD54 citations98
US7214620B2May 8, 2007
Methods of forming silicide films with metal films in semiconductor devices and contacts including the same
SAMSUNG ELECTRONICS CO LTD26 citations92
US7084061B2Aug 1, 2006
Methods of fabricating a semiconductor device having MOS transistor with strained channel
SAMSUNG ELECTRONICS CO LTD36 citations92
US10026890B2Jul 17, 2018
Magnetoresistive random access memory device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD6 citations84
US7833847B2Nov 16, 2010
Method of forming semiconductor device having stacked transistors
SAMSUNG ELECTRONICS CO LTD5 citations74
US7435634B2Oct 14, 2008
Methods of forming semiconductor devices having stacked transistors
SAMSUNG ELECTRONICS CO LTD8 citations74
US10062843B2Aug 28, 2018
Variable resistive memory device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD3 citations73
US7232756B2Jun 19, 2007
Nickel salicide process with reduced dopant deactivation
SAMSUNG ELECTRONICS CO LTD9 citations73
US7936024B2May 3, 2011
Semiconductor devices having stacked structures
SAMSUNG ELECTRONICS CO LTD3 citations63
US7238612B2Jul 3, 2007
Methods of forming a double metal salicide layer and methods of fabricating semiconductor devices incorporating the same
SAMSUNG ELECTRONICS CO LTD2 citations62
US10305037B2May 28, 2019
Variable resistive memory device
SAMSUNG ELECTRONICS CO LTD0 citations52
US10249816B2Apr 2, 2019
Magnetoresistive random access memory device
SAMSUNG ELECTRONICS CO LTD0 citations52
US7666786B2Feb 23, 2010
Methods of fabricating semiconductor devices having a double metal salicide layer
SAMSUNG ELECTRONICS CO LTD0 citations52
US7662707B2Feb 16, 2010
Method of forming relatively continuous silicide layers for semiconductor devices
SAMSUNG ELECTRONICS CO LTD0 citations52
US7579225B2Aug 25, 2009
Method of forming semiconductor device having stacked transistors
SAMSUNG ELECTRONICS CO LTD0 citations52
US7531459B2May 12, 2009
Methods of forming self-aligned silicide layers using multiple thermal processes
SAMSUNG ELECTRONICS CO LTD0 citations52
US7569483B2Aug 4, 2009
Methods of forming metal silicide layers by annealing metal layers using inert heat transferring gases established in a convection apparatus
SAMSUNG ELECTRONICS CO LTD0 citations41
SAMSUNG DISPLAY CO LTD
6 patentsUS11367768B2Jun 21, 2022
Display device
SAMSUNG DISPLAY CO LTD0 citations62
US12185602B2Dec 31, 2024
Display device
SAMSUNG DISPLAY CO LTD0 citations60
US11937476B2Mar 19, 2024
Display device
SAMSUNG DISPLAY CO LTD0 citations60
US12218142B2Feb 4, 2025
Display device
SAMSUNG DISPLAY CO LTD0 citations59
US11817458B2Nov 14, 2023
Display device
SAMSUNG DISPLAY CO LTD0 citations59
US11610957B2Mar 21, 2023
Display device
SAMSUNG DISPLAY CO LTD0 citations59