Inventor

SCHWARZL SIEGFRIED

DE40 patents

⚠️ This page may combine multiple inventors who share the name “SCHWARZL SIEGFRIED”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SCHWARZL SIEGFRIED

INFINEON TECHNOLOGIES AG

Method of fabricating a micro-technical structure, and micro-technical component

Memory cell configuration in which an electrical resistance of a memory element represents an information item and can be influenced by a magnetic field, and method for fabricating it

Memory cell configuration

Photolithographic mask having a structure region covered by a thin protective coating of only a few atomic layers and methods for the fabrication of the mask including ALCVD to form the thin protective coating

Magnetoresistive element and the use thereof as storage element in a storage cell array

Memory cell configuration and method for operating the configuration

Integrated electrical circuit and method for fabricating it

Semiconductor memory having mutually crossing word and bit lines, at which magnetoresistive memory cells are arranged

Polyvalent, magnetoresistive write/read memory and method for writing and reading a memory of this type

Read/write architecture for MRAM

Arrangement of microstructures

MRAM memory with drive logic arrangement

Method for producing an integrated circuit having at least one metalicized surface

Method for fabricating a lithographic reflection mask in particular for the patterning of a semiconductor wafer, and a reflection mask

Memory cell configuration and method for fabricating it

Passivation of multi-layer mirror for extreme ultraviolet lithography

EUV magnetic contrast lithography mask and manufacture thereof

Substrate with at least two metal structures deposited thereon, and method for fabricating the same

Memory cell configuration and production method

Magnetoresistive element and use thereof as a memory element in a memory cell configuration

Method for producing an annular microstructure element

Memory cell arrangement and method of fabricating it

Method for fabricating microstructures and arrangement of microstructures

Photosensitive coating material for a substrate and process for exposing the coated substrate

Magnetoresistive memory cell configuration and method for its production

Reticle stages for lithography systems and lithography methods

Memory cell array and method for manufacturing it

Reflection mask for EUV-lithography and method for fabricating the reflection mask

Hollow structure in an integrated circuit and method for producing such a hollow structure in an integrated circuit

Method for smoothing areas in structures by utilizing the surface tension

Method for determining a radiation power and an exposure apparatus

Semiconductor memory device with a capacitor formed therein and a method for forming the same

SIEMENS AG

Memory cell array and method for manufacturing it

Method for manufacturing a cubically integrated circuit arrangement

Method for the manufacture of bipolar transistor structures with self-adjusting emitter and base regions for extreme high frequency circuits

Method for manufacturing a trench structure in a substrate

Method for fastening a first substrate on a second substrate and employment of said method for manufacturing a three-dimensional circuit arrangement

SCHWARZL SIEGFRIED

Passivation of multi-layer mirror for extreme ultraviolet lithography

Passivation of multi-layer mirror for extreme ultraviolet lithography

QIMONDA AG

Device for generating and/or influencing electromagnetic radiation from a plasma