Inventor
WURM STEFAN
US23 patents
⚠️ This page may combine multiple inventors who share the name “WURM STEFAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AG
13 patentsUS7078134B2Jul 18, 2006
Photolithographic mask having a structure region covered by a thin protective coating of only a few atomic layers and methods for the fabrication of the mask including ALCVD to form the thin protective coating
INFINEON TECHNOLOGIES AG22 citations92
US6864175B2Mar 8, 2005
Method for fabricating integrated circuit arrangements, and associated circuit arrangements, in particular tunnel contact elements
INFINEON TECHNOLOGIES AG9 citations74
US7859648B2Dec 28, 2010
Passivation of multi-layer mirror for extreme ultraviolet lithography
INFINEON TECHNOLOGIES AG5 citations73
US7407729B2Aug 5, 2008
EUV magnetic contrast lithography mask and manufacture thereof
INFINEON TECHNOLOGIES AG7 citations73
US7294851B2Nov 13, 2007
Dense seed layer and method of formation
INFINEON TECHNOLOGIES AG7 citations73
US7576005B2Aug 18, 2009
Dense seed layer and method of formation
INFINEON TECHNOLOGIES AG3 citations62
US7029808B2Apr 18, 2006
Photosensitive coating material for a substrate and process for exposing the coated substrate
INFINEON TECHNOLOGIES AG6 citations61
US7626682B2Dec 1, 2009
Reticle stages for lithography systems and lithography methods
INFINEON TECHNOLOGIES AG1 citations52
US7586059B2Sep 8, 2009
Lithography mask substrate labeling system
INFINEON TECHNOLOGIES AG0 citations52
US6849365B2Feb 1, 2005
Reflection mask for EUV-lithography and method for fabricating the reflection mask
INFINEON TECHNOLOGIES AG1 citations52
US7547505B2Jun 16, 2009
Methods of forming capping layers on reflective materials
INFINEON TECHNOLOGIES AG0 citations42
US7417736B2Aug 26, 2008
Method for determining a radiation power and an exposure apparatus
INFINEON TECHNOLOGIES AG0 citations41
US7341875B2Mar 11, 2008
Semiconductor memory device with a capacitor formed therein and a method for forming the same
INFINEON TECHNOLOGIES AG0 citations41
SEMATECH INC
3 patentsUS7250620B2Jul 31, 2007
EUV lithography filter
SEMATECH INC20 citations89
US7709816B2May 4, 2010
Systems and methods for monitoring and controlling the operation of extreme ultraviolet (EUV) light sources used in semiconductor fabrication
SEMATECH INC5 citations60
US7760341B2Jul 20, 2010
Systems and methods for in-situ reflectivity degradation monitoring of optical collectors used in extreme ultraviolet (EUV) lithography processes
SEMATECH INC5 citations59