P

Inventor

KAWAKAMI SATORU

JP48 patents
⚠️ This page may combine multiple inventors who share the name “KAWAKAMI SATORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

36 patents
US5542559AAug 6, 1996

Plasma treatment apparatus

TOKYO ELECTRON LTD254 citations99
US6399520B1Jun 4, 2002

Semiconductor manufacturing method and semiconductor manufacturing apparatus

TOKYO ELECTRON LTD175 citations98
US5665166ASep 9, 1997

Plasma processing apparatus

TOKYO ELECTRON LTD190 citations98
US5478429ADec 26, 1995

Plasma process apparatus

TOKYO ELECTRON LTD473 citations98
US5665167ASep 9, 1997

Plasma treatment apparatus having a workpiece-side electrode grounding circuit

TOKYO ELECTRON LTD134 citations97
US6558508B1May 6, 2003

Processing apparatus having dielectric plates linked together by electrostatic force

TOKYO ELECTRON LTD71 citations96
US5494522AFeb 27, 1996

Plasma process system and method

TOKYO ELECTRON LTD90 citations95
US6470824B2Oct 29, 2002

Semiconductor manufacturing apparatus

TOKYO ELECTRON LTD26 citations92
US6358324B1Mar 19, 2002

Microwave plasma processing apparatus having a vacuum pump located under a susceptor

TOKYO ELECTRON LTD31 citations92
US6161498ADec 19, 2000

Plasma processing device and a method of plasma process

TOKYO ELECTRON LTD40 citations92
US6432208B1Aug 13, 2002

Plasma processing apparatus

TOKYO ELECTRON LTD42 citations91
US6066568AMay 23, 2000

Plasma treatment method and system

TOKYO ELECTRON LTD21 citations91
US11923170B2Mar 5, 2024

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD6 citations75
US6501082B1Dec 31, 2002

Plasma deposition apparatus and method with controller

TOKYO ELECTRON LTD13 citations74
US6284674B1Sep 4, 2001

Plasma processing device and a method of plasma process

TOKYO ELECTRON LTD8 citations73
US9305751B2Apr 5, 2016

Microwave plasma processing apparatus and microwave supplying method

TOKYO ELECTRON LTD4 citations72
US6452400B1Sep 17, 2002

Method of measuring negative ion density of plasma and plasma processing method and apparatus for carrying out the same

TOKYO ELECTRON LTD7 citations72
US6431114B1Aug 13, 2002

Method and apparatus for plasma processing

TOKYO ELECTRON LTD8 citations72
US12148637B2Nov 19, 2024

Substrate processing apparatus

TOKYO ELECTRON LTD0 citations63
US12051564B2Jul 30, 2024

Shower plate, plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD0 citations63
US12482635B2Nov 25, 2025

Plasma processing device, and plasma processing method

TOKYO ELECTRON LTD0 citations62
US12412732B2Sep 9, 2025

Plasma processing apparatus

TOKYO ELECTRON LTD0 citations62
US12020900B2Jun 25, 2024

Plasma processing device, and plasma processing method

TOKYO ELECTRON LTD0 citations62
US11538667B2Dec 27, 2022

Stage, plasma processing apparatus, and plasma processing method

TOKYO ELECTRON LTD0 citations62
US12362151B2Jul 15, 2025

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD0 citations60
US12482637B2Nov 25, 2025

Plasma source and plasma processing apparatus

TOKYO ELECTRON LTD0 citations52
US12456609B2Oct 28, 2025

Plasma processing apparatus

TOKYO ELECTRON LTD0 citations52
US12451326B2Oct 21, 2025

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD0 citations52
US12261025B2Mar 25, 2025

Plasma processing apparatus

TOKYO ELECTRON LTD0 citations52
US12217941B2Feb 4, 2025

Plasma processing apparatus, and plasma processing method

TOKYO ELECTRON LTD0 citations52
US12046455B2Jul 23, 2024

Shower plate, lower dielectric member and plasma processing apparatus

TOKYO ELECTRON LTD0 citations52
US11929234B2Mar 12, 2024

Plasma processing apparatus and lower stage

TOKYO ELECTRON LTD0 citations52
US9633821B2Apr 25, 2017

Microwave plasma processing apparatus and microwave supplying method

TOKYO ELECTRON LTD0 citations51
US12362143B2Jul 15, 2025

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD0 citations50
US12283465B2Apr 22, 2025

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD0 citations47
US10570512B2Feb 25, 2020

Substrate processing apparatus

TOKYO ELECTRON LTD0 citations41

TOYOTA MOTOR CO LTD

3 patents

TOBE YASUHIRO

2 patents

SONY CORP

2 patents

Lithium Energy Japan

2 patents

MITSUBISHI CHEM IND

1 patent

IMAI TADASHI

1 patent

GS YUASA INT LTD

1 patent