P

Inventor

MURAKAMI KATSUHIKO

JP37 patents
⚠️ This page may combine multiple inventors who share the name “MURAKAMI KATSUHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NIKON CORP

22 patents
US6441963B2Aug 27, 2002

Multi-layered mirror

NIKON CORP181 citations99
US5581605ADec 3, 1996

Optical element, production method of optical element, optical system, and optical apparatus

NIKON CORP148 citations98
US6522717B1Feb 18, 2003

Reflective-type soft x-ray microscope

NIKON CORP74 citations96
US6507641B1Jan 14, 2003

X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same

NIKON CORP78 citations96
US6333961B1Dec 25, 2001

Reflection masks, microlithography apparatus using same, and integrated circuit manufacturing methods employing same

NIKON CORP52 citations96
US6295164B1Sep 25, 2001

Multi-layered mirror

NIKON CORP49 citations96
US6160867ADec 12, 2000

Multi-layer X-ray-reflecting mirrors with reduced internal stress

NIKON CORP62 citations96
US6522716B1Feb 18, 2003

Multilayer-film reflective mirrors, extreme UV microlithography apparatus comprising same, and microelectronic-device manufacturing methods utilizing same

NIKON CORP49 citations93
US5399448AMar 21, 1995

Reflection mask for X ray

NIKON CORP36 citations93
US6861656B2Mar 1, 2005

High-luminosity EUV-source devices for use in extreme ultraviolet (soft X-ray) lithography systems and other EUV optical systems

NIKON CORP21 citations92
US7382527B2Jun 3, 2008

EUV multilayer mirror with phase shifting layer

NIKON CORP17 citations91
US6377655B1Apr 23, 2002

Reflective mirror for soft x-ray exposure apparatus

NIKON CORP42 citations88
US6909774B2Jun 21, 2005

Apparatus and methods for surficial milling of selected regions on surfaces of multilayer-film reflective mirrors as used in X-ray optical systems

NIKON CORP13 citations83
US5239566AAug 24, 1993

Multi-layered mirror

NIKON CORP19 citations82
US7456417B2Nov 25, 2008

Laser plasma EUV light source, target material, tape material, a method of producing target material, a method of providing targets, and an EUV exposure device

NIKON CORP8 citations74
US7417708B2Aug 26, 2008

Extreme ultraviolet exposure apparatus and vacuum chamber

NIKON CORP7 citations74
US5572564ANov 5, 1996

Reflecting photo mask for x-ray exposure and method for manufacturing the same

NIKON CORP15 citations74
US7741616B2Jun 22, 2010

EUV light source, EUV exposure equipment, and semiconductor device manufacturing method

NIKON CORP2 citations63
US7385212B2Jun 10, 2008

Collector optical system, light source unit, illumination optical apparatus, and exposure apparatus

NIKON CORP5 citations63
US7706058B2Apr 27, 2010

Multilayer mirror, method for manufacturing the same, and exposure equipment

NIKON CORP4 citations61
US7440182B2Oct 21, 2008

Multilayer mirror, method for manufacturing the same, and exposure equipment

NIKON CORP1 citations61
US10126660B2Nov 13, 2018

Multilayer film reflector, method of manufacturing multilayer film reflector, projection optical system, exposure apparatus, and method of manufacturing device

NIKON CORP0 citations52

NIPPON KOKAN KK

4 patents

ISHIDA KOKI SEISAKUSYO KK

2 patents

ISHIDA SCALE MFG CO LTD

2 patents

BUNKA SHUTTER

2 patents

MURAKAMI KATSUHIKO

2 patents

FUJITSU LTD

2 patents

HITACHI LTD

1 patent