Inventor
WATANABE TAMOTSU
JP15 patents
⚠️ This page may combine multiple inventors who share the name “WATANABE TAMOTSU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
4 patentsUS7501223B2Mar 10, 2009
Polymer, resist composition and patterning process using the same
SHINETSU CHEMICAL CO20 citations92
US8343694B2Jan 1, 2013
Photomask blank, resist pattern forming process, and photomask preparation process
SHINETSU CHEMICAL CO11 citations84
US7977027B2Jul 12, 2011
Resist composition and patterning process
SHINETSU CHEMICAL CO15 citations84
US8367295B2Feb 5, 2013
Preparation process of chemically amplified resist composition
SHINETSU CHEMICAL CO0 citations52
TAKEDA TAKANOBU
3 patentsUS9075306B2Jul 7, 2015
Chemically amplified negative resist composition and patterning process
TAKEDA TAKANOBU22 citations92
US8110335B2Feb 7, 2012
Resist patterning process and manufacturing photo mask
TAKEDA TAKANOBU6 citations72
US8193307B2Jun 5, 2012
Synthesis of photoresist polymer
TAKEDA TAKANOBU0 citations41