Inventor
KOITABASHI RYUJI
JP15 patents
⚠️ This page may combine multiple inventors who share the name “KOITABASHI RYUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
10 patentsUS7501223B2Mar 10, 2009
Polymer, resist composition and patterning process using the same
SHINETSU CHEMICAL CO20 citations92
US8343694B2Jan 1, 2013
Photomask blank, resist pattern forming process, and photomask preparation process
SHINETSU CHEMICAL CO11 citations84
US7977027B2Jul 12, 2011
Resist composition and patterning process
SHINETSU CHEMICAL CO15 citations84
US7312016B2Dec 25, 2007
Chemically amplified positive resist composition and patterning process
SHINETSU CHEMICAL CO11 citations84
US6861198B2Mar 1, 2005
Negative resist material and pattern formation method using the same
SHINETSU CHEMICAL CO9 citations73
US7288363B2Oct 30, 2007
Chemically amplified positive resist composition and patterning process
SHINETSU CHEMICAL CO4 citations62
US8367295B2Feb 5, 2013
Preparation process of chemically amplified resist composition
SHINETSU CHEMICAL CO0 citations52
US8753786B2Jun 17, 2014
Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank
SHINETSU CHEMICAL CO0 citations50
US10768524B2Sep 8, 2020
Photomask blank substrate container, method for storing photomask blank substrate and method for transporting photomask blank substrate
SHINETSU CHEMICAL CO0 citations41
US8753787B2Jun 17, 2014
Light pattern exposure method, photomask, and photomask blank
SHINETSU CHEMICAL CO0 citations40