Inventor

TANAKA AKINOBU

JP41 patents

⚠️ This page may combine multiple inventors who share the name “TANAKA AKINOBU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TANAKA AKINOBU

SHINETSU CHEMICAL CO

Positive resist composition

Sulfonium salts and chemically amplified positive resist compositions

Chemically amplified positive photoresist composition and pattern forming process

Chemically amplified positive resist composition

Chemically amplified positive resist composition

Sulfonium salts and chemically amplified positive resist compositions

Positive resist material

Onium salts and positive resist materials using the same

Chemically amplified positive resist composition

Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions

Positive resist composition comprising a bis (t-butoxycarbonylmethly(thymolphthalein as a dissolution inhibitor

Negative resist composition and patterning process using the same

Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same

Negative resist composition and patterning process

NIPPON TELEGRAPH & TELEPHONE

Negative working resist material, method for the production of the same and process of forming resist patterns using the same

Photosensitive resin composition and process for forming photo-resist pattern using the same

Pattern forming material and method for forming pattern therewith

Photosensitive and high energy beam sensitive resin composition containing substituted polysiloxane

Pattern forming material of a siloxane polymer

Coating composition for forming insulating film on electroconductive substrate for printed circuits and method therefor

TANAKA AKINOBU

Negative resist composition and patterning process

Positive resist composition and pattern forming process

Chemically amplified positive resist composition and resist patterning process

Negative resist composition, patterning process, and testing process and preparation process of negative resist composition

Negative resist composition and patterning process

Patterning process

MASUNAGA KEIICHI

Chemically amplified negative resist composition for EB or EUV lithography and patterning process

Polymer, chemically amplified negative resist composition, and patterning process

Chemically amplified positive resist composition for EB or EUV lithography and patterning process

Chemically amplified resist composition and pattern forming process

Chemically amplified positive resist composition and pattern forming process

WATANABE SATOSHI

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

TAKEDA TAKANOBU

Chemically amplified negative resist composition and patterning process

Resist patterning process and manufacturing photo mask

TOSOH CORP

Photosensitive material having a silicon-containing polymer

Photosensitive material having a silicon-containing polymer

FUJI PHOTO FILM CO LTD

Resist composition comprising a siloxane or silsesquioxane polymer having silanol groups in a composition with a naphthoquinone compound

PANASONIC CORP

Order receiving system and order receiving method

DOMON DAISUKE

Negative resist composition and patterning process