Inventor
MOORE SCOTT E
US158 patents
⚠️ This page may combine multiple inventors who share the name “MOORE SCOTT E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
47 patentsUS7053775B2May 30, 2006
RFID material tracking method and apparatus
MICRON TECHNOLOGY INC78 citations99
US7042358B2May 9, 2006
RFID material tracking method and apparatus
MICRON TECHNOLOGY INC103 citations99
US6956538B2Oct 18, 2005
RFID material tracking method and apparatus
MICRON TECHNOLOGY INC117 citations99
US6714121B1Mar 30, 2004
RFID material tracking method and apparatus
MICRON TECHNOLOGY INC488 citations99
US6368193B1Apr 9, 2002
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC144 citations99
US6364757B2Apr 2, 2002
Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates
MICRON TECHNOLOGY INC142 citations99
US6361411B1Mar 26, 2002
Method for conditioning polishing surface
MICRON TECHNOLOGY INC88 citations99
US6358127B1Mar 19, 2002
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC130 citations99
US6354930B1Mar 12, 2002
Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates
MICRON TECHNOLOGY INC157 citations99
US6352466B1Mar 5, 2002
Method and apparatus for wireless transfer of chemical-mechanical planarization measurements
MICRON TECHNOLOGY INC219 citations99
US6312558B2Nov 6, 2001
Method and apparatus for planarization of a substrate
MICRON TECHNOLOGY INC122 citations99
US6306014B1Oct 23, 2001
Web-format planarizing machines and methods for planarizing microelectronic substrate assemblies
MICRON TECHNOLOGY INC115 citations99
US6306008B1Oct 23, 2001
Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
MICRON TECHNOLOGY INC146 citations99
US6273796B1Aug 14, 2001
Method and apparatus for planarizing a microelectronic substrate with a tilted planarizing surface
MICRON TECHNOLOGY INC117 citations99
US6261163B1Jul 17, 2001
Web-format planarizing machines and methods for planarizing microelectronic substrate assemblies
MICRON TECHNOLOGY INC160 citations99
US6234878B1May 22, 2001
Endpoint detection apparatus, planarizing machines with endpointing apparatus, and endpointing methods for mechanical or chemical-mechanical planarization of microelectronic substrate assemblies
MICRON TECHNOLOGY INC197 citations99
US6206754B1Mar 27, 2001
Endpoint detection apparatus, planarizing machines with endpointing apparatus, and endpointing methods for mechanical or chemical-mechanical planarization of microelectronic substrate assemblies
MICRON TECHNOLOGY INC190 citations99
US6196899B1Mar 6, 2001
Polishing apparatus
MICRON TECHNOLOGY INC160 citations99
US6193588B1Feb 27, 2001
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC154 citations99
US6187681B1Feb 13, 2001
Method and apparatus for planarization of a substrate
MICRON TECHNOLOGY INC184 citations99
US6139402AOct 31, 2000
Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates
MICRON TECHNOLOGY INC160 citations99
US5747386AMay 5, 1998
Rotary coupling
MICRON TECHNOLOGY INC160 citations99
US6609947B1Aug 26, 2003
Planarizing machines and control systems for mechanical and/or chemical-mechanical planarization of micro electronic substrates
MICRON TECHNOLOGY INC112 citations98
US6447369B1Sep 10, 2002
Planarizing machines and alignment systems for mechanical and/or chemical-mechanical planarization of microelectronic substrates
MICRON TECHNOLOGY INC116 citations98
US6364746B2Apr 2, 2002
Endpoint detection apparatus, planarizing machines with endpointing apparatus, and endpointing methods for mechanical or chemical-mechanical planarization of microelectronic-substrate assemblies
MICRON TECHNOLOGY INC102 citations98
US6152808ANov 28, 2000
Microelectronic substrate polishing systems, semiconductor wafer polishing systems, methods of polishing microelectronic substrates, and methods of polishing wafers
MICRON TECHNOLOGY INC95 citations98
US5833519ANov 10, 1998
Method and apparatus for mechanical polishing
MICRON TECHNOLOGY INC133 citations98
US7144304B2Dec 5, 2006
Method and apparatus for planarizing a microelectronic substrate with a tilted planarizing surface
MICRON TECHNOLOGY INC31 citations96
US7001251B2Feb 21, 2006
Method and apparatus for releasably attaching a polishing pad to a chemical-mechanical planarization machine
MICRON TECHNOLOGY INC35 citations96
US6840840B2Jan 11, 2005
Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
MICRON TECHNOLOGY INC24 citations96
US6623329B1Sep 23, 2003
Method and apparatus for supporting a microelectronic substrate relative to a planarization pad
MICRON TECHNOLOGY INC62 citations96
US6537915B2Mar 25, 2003
Methods of treating surfaces of substrates
MICRON TECHNOLOGY INC36 citations96
US6492273B1Dec 10, 2002
Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies
MICRON TECHNOLOGY INC51 citations96
US6468912B2Oct 22, 2002
Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies
MICRON TECHNOLOGY INC26 citations96
US6461964B2Oct 8, 2002
Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies
MICRON TECHNOLOGY INC28 citations96
US7229336B2Jun 12, 2007
Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
MICRON TECHNOLOGY INC14 citations93
US7220166B2May 22, 2007
Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate
MICRON TECHNOLOGY INC16 citations93
US7074113B1Jul 11, 2006
Methods and apparatus for removing conductive material from a microelectronic substrate
MICRON TECHNOLOGY INC36 citations93
US6969297B2Nov 29, 2005
Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
MICRON TECHNOLOGY INC13 citations93
US6773332B2Aug 10, 2004
Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
MICRON TECHNOLOGY INC21 citations93
US6736698B2May 18, 2004
Method and apparatus for wireless transfer of chemical-mechanical planarization measurements
MICRON TECHNOLOGY INC20 citations93
US6672949B2Jan 6, 2004
Polishing apparatus
MICRON TECHNOLOGY INC17 citations93
US6642140B1Nov 4, 2003
System for filling openings in semiconductor products
MICRON TECHNOLOGY INC24 citations93
US6613105B1Sep 2, 2003
System for filling openings in semiconductor products
MICRON TECHNOLOGY INC26 citations93
US6602380B1Aug 5, 2003
Method and apparatus for releasably attaching a polishing pad to a chemical-mechanical planarization machine
MICRON TECHNOLOGY INC15 citations93
US6572440B2Jun 3, 2003
Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
MICRON TECHNOLOGY INC15 citations93
US6544109B1Apr 8, 2003
Slurry delivery and planarization systems
MICRON TECHNOLOGY INC28 citations93
ROUND ROCK RES LLC
2 patentsMICRO TECHNOLOGY INC
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