Inventor
WAKABAYASHI SATOSHI
JP35 patents
⚠️ This page may combine multiple inventors who share the name “WAKABAYASHI SATOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
EBARA CORP
17 patentsUS6609962B1Aug 26, 2003
Dressing apparatus and polishing apparatus
EBARA CORP85 citations98
US6878044B2Apr 12, 2005
Polishing apparatus
EBARA CORP47 citations96
US6358128B1Mar 19, 2002
Polishing apparatus
EBARA CORP61 citations96
US6578891B1Jun 17, 2003
Substrate holder and substrate transfer apparatus using the same
EBARA CORP49 citations93
US6390901B1May 21, 2002
Polishing apparatus
EBARA CORP51 citations93
US7632378B2Dec 15, 2009
Polishing apparatus
EBARA CORP15 citations92
US7063598B2Jun 20, 2006
Substrate delivery mechanism
EBARA CORP19 citations92
US6916231B2Jul 12, 2005
Polishing apparatus
EBARA CORP31 citations92
US6682408B2Jan 27, 2004
Polishing apparatus
EBARA CORP21 citations92
US6354922B1Mar 12, 2002
Polishing apparatus
EBARA CORP50 citations92
US6358126B1Mar 19, 2002
Polishing apparatus
EBARA CORP17 citations84
US6358131B1Mar 19, 2002
Polishing apparatus
EBARA CORP17 citations84
US7850817B2Dec 14, 2010
Polishing device and substrate processing device
EBARA CORP15 citations83
US6602119B1Aug 5, 2003
Dressing apparatus
EBARA CORP9 citations74
US6379229B1Apr 30, 2002
Polishing apparatus
EBARA CORP7 citations74
US7645185B2Jan 12, 2010
Substrate delivery mechanism
EBARA CORP5 citations73
US7160180B2Jan 9, 2007
Substrate delivery mechanism
EBARA CORP3 citations62
TOKYO ELECTRON LTD
11 patentsUS6069093AMay 30, 2000
Process of forming metal films and multi layer structure
TOKYO ELECTRON LTD9 citations74
US11248296B2Feb 15, 2022
Source gas supply apparatus, film forming apparatus, and source gas supply method
TOKYO ELECTRON LTD1 citations62
US7981794B2Jul 19, 2011
Film forming method and substrate processing apparatus
TOKYO ELECTRON LTD6 citations62
US7737005B2Jun 15, 2010
Method for forming Ti film and TiN film, contact structure, computer readable storing medium and computer program
TOKYO ELECTRON LTD6 citations62
US11549179B2Jan 10, 2023
Film forming method
TOKYO ELECTRON LTD0 citations54
US12416082B2Sep 16, 2025
Processing method and substrate processing system
TOKYO ELECTRON LTD0 citations52
US9349642B2May 24, 2016
Method of forming contact layer
TOKYO ELECTRON LTD1 citations51
US7514120B2Apr 7, 2009
Precoat film forming method
TOKYO ELECTRON LTD0 citations42
US9620370B2Apr 11, 2017
Method of forming Ti film
TOKYO ELECTRON LTD0 citations41
US7906442B2Mar 15, 2011
Gas treatment method and computer readable storage medium
TOKYO ELECTRON LTD0 citations41
US10242878B2Mar 26, 2019
Substrate processing method and recording medium
TOKYO ELECTRON LTD0 citations36